IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD OF MANUFACTURING ARTICLE

• US 20190310547A1
• Filed: 04/01/2019
• Published: 10/10/2019
• Est. Priority Date: 04/06/2018
• Status: Active Grant

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Kondo, Hiroyuki
• Granted Patent: US 11,106,129 B2
• Time in Patent Office: Days
• CPC Class Codes: G03F 7/0002 Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

Abstract

An imprint apparatus performs an imprint process for forming a pattern of a cured product of an imprint material on a substrate by using a mold. The apparatus includes a substrate holder configured to hold the substrate, a substrate deformation mechanism configured to deform the substrate so the substrate will have a convex shape toward the mold in a state in which the substrate is held by the substrate holder, and a controller configured to control the deformation of the substrate by the substrate deformation mechanism in accordance with orientation information related to a crystal orientation of the substrate and a target shot region on which the imprint process is to be performed among a plurality of shot regions on the substrate.

Claims

1. An imprint apparatus that performs an imprint process to form a pattern of a cured product of an imprint material on a substrate by using a mold, the apparatus comprising:

a substrate holder configured to hold the substrate;

a substrate deformation mechanism configured to deform the substrate so the substrate will have a convex shape toward the mold in a state in which the substrate is held by the substrate holder; and

a controller configured to control the deformation of the substrate by the substrate deformation mechanism in accordance with orientation information related to a crystal orientation of the substrate and a target shot region on which the imprint process is to be performed among a plurality of shot regions on the substrate.

2. The apparatus according to claim 1, wherein the substrate holder includes the substrate deformation mechanism.

3. The apparatus according to claim 1, wherein in a case in which the imprint process is to be performed on a second shot region among the plurality of shot regions without performing the imprint process on another shot region among the plurality of shot regions after the imprint process is performed on a first shot region among the plurality of shot regions, the controller will execute deformation control, which corresponds to the second shot region, on the substrate by the substrate deformation mechanism after the imprint process is performed on the first shot region.

4. The apparatus according to claim 1, wherein the substrate includes a mark indicating the crystal orientation, and

the controller controls the deformation of the substrate by the substrate deformation mechanism in accordance with a position of the mark on the substrate in a state in which the substrate is held by the substrate holder and a position of the target shot region on the substrate in the state.

5. The apparatus according to claim 4, wherein the controller generates corrected control information for the imprint process on the target shot region by correcting reference control information for controlling the substrate deformation mechanism, and controls the substrate deformation mechanism in accordance with the corrected control information in the imprint process on the target shot region, and

the controller generates the corrected control information by correcting the reference control information based on an orientation of the mark on the substrate in the state and an orientation of the target shot region on the substrate in the state.

6. The apparatus according to claim 5, wherein in a state in which the substrate is deformed by the substrate deformation mechanism, a deflection amount of the substrate on a circumference about the center of the substrate periodically changes along the circumference, and

the controller generates the corrected control information by correcting the reference control information so the deflection amount of the target shot region will be a target deflection amount in the imprint process on the target shot region.

7. The apparatus according to claim 6, wherein the controller holds a function that indicates the deflection amount of the substrate on the circumference, and

the function is a function which uses, as a variable, an orientation indicating the position of the target shot region.

8. The apparatus according to claim 7, wherein the function is a periodic function.

9. The apparatus according to claim 1, wherein the substrate deformation mechanism includes a plurality of concave portions concentrically arranged on a holding surface configured to hold the substrate, and deforms the substrate by controlling the pressure of each of the plurality of concave portions.

10. The apparatus according to claim 1, wherein at least in a case in which the target shot region is a shot region arranged in a peripheral region on the substrate, the controller controls the deformation of the substrate by the substrate deformation mechanism in accordance with the orientation information and the target shot region.

12. A method of manufacturing an article comprising:

forming a pattern on a substrate by using an imprint apparatus defined in claim 1;

performing processing on the substrate on which the pattern has been formed in the forming; and

manufacturing the article from the processed substrate.

11. An imprint method for performing an imprint process to form a pattern a cured product of an imprint material on a substrate by using a mold, the method comprising:

deforming the substrate so the substrate will have a convex shape toward the mold in a state in which the substrate is held by a substrate holder; and

generating information for controlling the deformation of the substrate in the deforming in accordance with orientation information related to a crystal orientation of the substrate and a target shot region on which the imprint process is to be performed among a plurality of shot regions on the substrate.