SUBSTRATE SUPPORTING APPARATUS
First Claim
1. A substrate supporting apparatus, comprising:
- a rotatable chuck for supporting a substrate, defining a plurality of first injecting ports and a plurality of second injecting ports, the first injecting ports connecting to a gas pipe for supplying gas to the substrate and sucking the substrate by Bernoulli effect, the second injecting ports connecting to another gas pipe for supplying gas to the substrate and lifting the substrate;
a plurality of locating pins disposed at the top surface of the rotatable chuck, the plurality of locating pins being divided into a first group of locating pins and a second group of locating pins, every locating pin being driven by an independent cylinder, the cylinders which drive the first group of locating pins connecting to a gas pipe, the cylinders which drive the second group of locating pins connecting to another gas pipe;
a hollow shaft, an inner wall of the hollow shaft defining four gas grooves, every gas groove corresponding to one gas pipe for supplying gas to the gas pipe;
a rotary spindle, being set in the hollow shaft and a spacing formed between an outer wall of the rotary spindle and the inner wall of the hollow shaft;
two pairs of seal rings, wherein one pair of seal rings is disposed at opposite sides of one gas groove which supplies gas to the cylinders for driving the first group of locating pins, one pair of seal rings is disposed at opposite sides of one gas groove which supplies gas to the cylinders for driving the second group of locating pins;
wherein the hollow shaft defines an exhaust port between two adjacent gas grooves, wherein one gas groove supplies gas to the cylinders for driving the first group of locating pins or the second group of locating pins, one gas groove supplies gas to the first injecting ports or the second injecting ports, wherein the outer wall of the rotary spindle defines a blocking wall corresponding to the exhaust port of the hollow shaft and a recess matching the gas groove which supplies gas to the first injecting ports or the second injecting ports.
1 Assignment
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Accused Products
Abstract
A substrate supporting apparatus (300) for cleaning a back side of a substrate (107) is provided. The substrate supporting apparatus (300) has a hollow shaft (319) and a rotary spindle (303). The rotary spindle (303) is set in the hollow shaft (319) and a spacing is formed between an outer wall of the rotary spindle (303) and an inner wall of the hollow shaft (319). The outer wall of the rotary spindle (303) defines a blocking wall (322) and a recess (324) to prevent particles in the spacing from entering a gas groove (325) which is formed on the hollow shaft (319) and supplies gas to a front side of the substrate (107), avoiding the particles contaminating the front side of the substrate (107), which improves the quality of semiconductor devices.
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Citations
10 Claims
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1. A substrate supporting apparatus, comprising:
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a rotatable chuck for supporting a substrate, defining a plurality of first injecting ports and a plurality of second injecting ports, the first injecting ports connecting to a gas pipe for supplying gas to the substrate and sucking the substrate by Bernoulli effect, the second injecting ports connecting to another gas pipe for supplying gas to the substrate and lifting the substrate; a plurality of locating pins disposed at the top surface of the rotatable chuck, the plurality of locating pins being divided into a first group of locating pins and a second group of locating pins, every locating pin being driven by an independent cylinder, the cylinders which drive the first group of locating pins connecting to a gas pipe, the cylinders which drive the second group of locating pins connecting to another gas pipe; a hollow shaft, an inner wall of the hollow shaft defining four gas grooves, every gas groove corresponding to one gas pipe for supplying gas to the gas pipe; a rotary spindle, being set in the hollow shaft and a spacing formed between an outer wall of the rotary spindle and the inner wall of the hollow shaft; two pairs of seal rings, wherein one pair of seal rings is disposed at opposite sides of one gas groove which supplies gas to the cylinders for driving the first group of locating pins, one pair of seal rings is disposed at opposite sides of one gas groove which supplies gas to the cylinders for driving the second group of locating pins; wherein the hollow shaft defines an exhaust port between two adjacent gas grooves, wherein one gas groove supplies gas to the cylinders for driving the first group of locating pins or the second group of locating pins, one gas groove supplies gas to the first injecting ports or the second injecting ports, wherein the outer wall of the rotary spindle defines a blocking wall corresponding to the exhaust port of the hollow shaft and a recess matching the gas groove which supplies gas to the first injecting ports or the second injecting ports. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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Specification