SEMICONDUCTOR DEVICE
First Claim
1. A semiconductor device comprising:
- a drift region of a first-conductivity-type provided in a semiconductor substrate;
a base region of a second-conductivity-type provided above the drift region on an upper surface side in the semiconductor substrate;
a plurality of trench portions arranged next to each other in a predetermined arrangement direction on an upper surface of the semiconductor substrate;
an emitter region of a first-conductivity-type which has a higher doping concentration than the drift region and is provided in a mesa portion between adjacent ones of the plurality of trench portions;
an accumulation region of a first-conductivity-type which has a higher doping concentration than the drift region and is provided in a mesa portion between adjacent ones of the plurality of trench portions; and
a second-conductivity-type region of a second-conductivity-type which has a higher doping concentration than the base region and is provided in a mesa portion between adjacent ones of the plurality of trench portions;
wherein the accumulation region and the second-conductivity-type region are provided between the base region and the drift region in a non-channel mesa portion that does not have the emitter region provided therein and that is of mesa portions between adjacent ones of the plurality of trench portions.
1 Assignment
0 Petitions
Accused Products
Abstract
The present invention provides a semiconductor device including (a) a drift region of a first-conductivity-type, (b) a base region of a second-conductivity-type, (c) a plurality of trench portions arranged next to each other in a predetermined arrangement direction on the upper surface of the semiconductor substrate, (d) an emitter region of a first-conductivity-type which has a higher doping concentration than the drift region, (e) an accumulation region of a first-conductivity-type which has a higher doping concentration than the drift region, and (f) a second-conductivity-type region of a second-conductivity-type which has a higher doping concentration than the base region, wherein the accumulation region and the second-conductivity-type region are provided between the base region and the drift region in a non-channel mesa portion that does not have the emitter region provided therein and that is of mesa portions between adjacent ones of the plurality of trench portions.
4 Citations
14 Claims
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1. A semiconductor device comprising:
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a drift region of a first-conductivity-type provided in a semiconductor substrate; a base region of a second-conductivity-type provided above the drift region on an upper surface side in the semiconductor substrate; a plurality of trench portions arranged next to each other in a predetermined arrangement direction on an upper surface of the semiconductor substrate; an emitter region of a first-conductivity-type which has a higher doping concentration than the drift region and is provided in a mesa portion between adjacent ones of the plurality of trench portions; an accumulation region of a first-conductivity-type which has a higher doping concentration than the drift region and is provided in a mesa portion between adjacent ones of the plurality of trench portions; and a second-conductivity-type region of a second-conductivity-type which has a higher doping concentration than the base region and is provided in a mesa portion between adjacent ones of the plurality of trench portions; wherein the accumulation region and the second-conductivity-type region are provided between the base region and the drift region in a non-channel mesa portion that does not have the emitter region provided therein and that is of mesa portions between adjacent ones of the plurality of trench portions. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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Specification