System and Method for Accurate Application and Curing of Nail Polish

• US 20190313765A1
• Filed: 04/10/2019
• Published: 10/17/2019
• Est. Priority Date: 04/13/2018
• Status: Active Grant

• Current Assignee: Feedback, LLC
• Original Assignee: Coral Labs, Inc.
• Inventors: Leong, Bradley
• Granted Patent: US 10,750,838 B2
• Time in Patent Office: Days
• CPC Class Codes: A45D 2029/008 Devices for protecting the nails, e.g. after manicuring
• CPC Class Codes: A45D 29/00 Manicuring or pedicuring implements
• CPC Class Codes: A45D 29/004 Masking devices for applying polish to the finger nails
• CPC Class Codes: A45D 29/11 Polishing devices for nails
• CPC Class Codes: A45D 29/18 Manicure or pedicure sets, e.g. combinations without case, etui, or the like combined with or on sheath of scissors B26B13/22, B26B29/04
• CPC Class Codes: A45D 29/22 Finger-supports
• CPC Class Codes: A45D 34/04 Appliances specially adapted for applying liquid, e.g. using roller or ball
• CPC Class Codes: A61Q 3/02 Nail coatings
• CPC Class Codes: G06F 3/1208 resulting in improved quality of the output result, e.g. print layout, colours, workflows, print preview
• CPC Class Codes: G06F 3/13 Digital output to plotter ; Cooperation and interconnection of the plotter with other functional units
• CPC Class Codes: H04N 1/00005 relating to image data
• CPC Class Codes: H04N 1/00238 using an image reproducing device as a local output from a computer output via network, e.g. network printing H04N1/00233
• CPC Class Codes: H04N 1/00246 with an optical device, e.g. an optical viewing aid
• CPC Class Codes: H04N 1/00278 with a printing apparatus, e.g. a laser beam printer
• CPC Class Codes: H04N 1/405 Halftoning, i.e. converting the picture signal of a continuous-tone original into a corresponding signal showing only two levels

Abstract

A nail polish application system may include a nail polish applicator to apply a curable nail polish to a nail of a user. An energy source may emit energy to selectively cure the curable nail polish. A sensor may be provided to detect a boundary of the nail of the user. The energy source may be configured to direct the energy to (i) the detected boundary of the nail during a first curing stage or (ii) to an area within the detected boundary of the nail during the first curing stage, and to (iii) avoid directing the energy to an area outside the detected boundary of the nail during the first curing stage.

Claims

1. A nail polish application system comprising:

a nail polish applicator configured to apply a curable nail polish to a nail of a user; and

an energy source configured to emit energy to selectively cure the curable nail polish on the nail.

2. The nail polish application system of claim 1, further comprising a sensor for detecting a boundary of the nail of the user, the sensor being operatively connected to the energy source.

3. The nail polish application system of claim 2, wherein the energy source is configured to direct the energy to (i) the detected boundary of the nail during a first curing stage or (ii) to an area within the detected boundary of the nail during the first curing stage, and to (iii) avoid directing the energy to area outside the detected boundary of the nail during the first curing stage.

4. The nail polish application system of claim 1, wherein the nail polish applicator is configured to apply droplets of the nail polish to the nail of the user.

5. The nail polish system of claim 2, further comprising a structured light system having a projector and light sensor configured to detect energy projected by the projector.

6. The nail polish system of claim 5, wherein the projector of the structured light system functions as the energy source, and the light sensor of the structured light system functions as the sensor.

7. The nail polish system of claim 5, wherein the structured light system is configured to assist in detecting curvature of the nail in a depth direction.

8. The nail polish system of claim 1, wherein the energy source includes a UV energy source and the nail polish is at least partially UV curable.

9. The nail polish system of claim 1, wherein the energy source includes at least one mirror capable of movement in at least one degree of freedom.

10. The nail polish system of claim 1, wherein the energy source further includes a UV energy source to apply UV energy in all directions to non-selectively cure the nail polish.

11. The nail polish application system of claim 2, wherein the sensor is configured to detect the boundary of the nail of the user periodically to update the detected boundary of the nail over time.

12. The nail polish application system of claim 2, wherein the sensor is configured to detect motion of a finger of the user, the finger containing the nail of the user, in order to (i) update a position of the boundary or (ii) update a shape of the boundary.

13. A nail polish application mechanism comprising:

a housing having a first side and a second side opposite the first side;

a first applicator coupled to the first side of the housing and being impregnated with a nail polish resin configured to be cured by an electromagnetic energy; and

a first seal coupled to the housing, the first applicator being positioned within a closed volume defined between the housing and the first seal, the first seal adapted to block the electromagnetic energy from striking the first applicator while the first seal is coupled to the housing.

14. The nail polish application mechanism of claim 13 further comprising a second applicator coupled to the housing and being impregnated with a solution in which the nail polish resin is at least partially soluble.

15. The nail polish application mechanism of claim 13, wherein the first applicator extends between a first applicator base and a first applicator tip, the first applicator base being coupled to the first side of the housing, the housing including a plurality of first side walls and a first base that together form a first recess, the first applicator base being at least partially positioned within the first recess, and the first applicator tip extending beyond the plurality of first side walls

16. The nail polish application mechanism of claim 13, wherein the first applicator is an open-cell foam.

17. The nail polish application mechanism of claim 13, further comprising:

a second applicator coupled to the housing and being impregnated with a solution in which the nail polish resin is at least partially soluble; and

a second seal coupled to the housing, the second applicator being positioned within a closed volume defined between the housing and the second seal.

18. The nail polish application mechanism of claim 13, wherein the housing includes a mating mechanism configured to releasably couple to a corresponding mating member of a nail polish application system.

19. A nail polish application system, comprising:

the nail polish application mechanism of claim 13;

a system housing; and

a movable member movably coupled to the system housing;

wherein the housing of the nail polish application mechanism includes a mating mechanism configured to releasably couple to the movable member.

20. The nail polish application system of claim 19, wherein the movable member is movable in one, two, or three degrees of freedom of motion.