X-ray Analysis Apparatus and Method

• US 20190317030A1
• Filed: 04/12/2019
• Published: 10/17/2019
• Est. Priority Date: 04/13/2018
• Status: Active Grant

• Current Assignee: Malvern Panalytical B.V. (Spectris PLC)
• Original Assignee: Malvern Panalytical B.V. (Spectris PLC)
• Inventors: BECKERS, Detlef, GATESHKI, Milen, BOKSEM, Jaap
• Granted Patent: US 11,035,805 B2
• Time in Patent Office: Days
• CPC Class Codes: G01N 2223/076 X-ray fluorescence
• CPC Class Codes: G01N 2223/316 collimators
• CPC Class Codes: G01N 23/20 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
• CPC Class Codes: G01N 23/20008 Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor monochromators for X- rays using crystals G21K1/06
• CPC Class Codes: G01N 23/201 by measuring small-angle scattering
• CPC Class Codes: G01N 23/2055 Analysing diffraction patterns
• CPC Class Codes: G01N 23/207 Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions

Abstract

An X-ray analysis apparatus comprises an X-ray source configured to irradiate a sample with an incident X-ray beam. A first beam mask component is arranged between the X-ray source and the sample. The first beam mask component has a first opening for limiting the size of the incident X-ray beam. When the first beam mask component is in a first configuration, the first opening is arranged in the incident X-ray beam. The first beam mask component further comprises a second opening. When the first beam mask component is in a second configuration, the second opening is arranged in the incident X-ray beam. The second opening does not limit the size of the incident X-ray beam. A controller is configured to control a first beam mask component actuator to change the configuration of the first beam mask component between the first configuration and the second configuration by moving the first beam mask component in a plane intersected by the incident X-ray beam.

Claims

1. An X-ray analysis apparatus (2), comprising:

an X-ray source (4) for generating X-rays;

a sample stage (8) configured to support a sample (6), the X-ray source and the sample stage being arranged so that X-rays generated by the X-ray source define an incident X-ray beam (12) that irradiates the sample, wherein the incident X-ray beam is directed from the X-ray source to the sample along an incident X-ray beam path;

a first beam mask component (22) arranged between the X-ray source (4) and the sample (6), in the incident X-ray beam path, wherein the first beam mask component (22) comprises a body (220), a first opening (222) for limiting the size and/or divergence of the incident X-ray beam and a second opening (224);

wherein the first beam mask component (22) has a first configuration and a second configuration, wherein in the first configuration;

the first opening (222) is arranged in the incident X-ray beam path so as to limit the size and/or divergence of the incident X-ray beam and the second opening (224) is arranged outside of the incident X-ray beam path, and

in the second configuration;

the second opening (224) is arranged in the incident X-ray beam path, and the body (220) and the first opening (222) are arranged outside of the incident X-ray beam path; and

the X-ray analysis apparatus further comprises a controller (17) configured to control a first beam mask component actuator (225) to change the configuration of the first beam mask component (22) between the first configuration and the second configuration by moving the first beam mask component (22) in a plane intersected by the incident X-ray beam.

2. The X-ray analysis apparatus (2) of claim 1, further comprising:

a second beam mask component (25) arranged between the first beam mask component (22) and the sample (6), the second beam mask component (25) comprising a body (250), a first opening (252) for limiting the size and/or divergence of the incident X-ray beam and a second opening (254);

the second beam mask component (25) having a first configuration and a second configuration, wherein in the first configuration;

the first opening (252) is arranged in the incident X-ray beam path and the second opening (254) is arranged outside of the incident X-ray beam path, and

in the second configuration;

the second opening (254) is arranged in the incident X-ray beam path, and the body (250) and the first opening (252) are arranged outside of the incident X-ray beam path; and

wherein the controller (17) is configured to control a second beam mask component actuator (255) to change the configuration of the second beam mask component (25) between the first configuration and the second configuration by moving the second beam mask component (25) in a plane intersected by the incident X-ray beam.

3. The X-ray analysis apparatus of claim 2 wherein the controller (17) is configured to control the first beam mask component actuator (225) and the second beam mask component actuator (255) to move the first beam mask component (22) and the second beam mask component (25) respectively between any two of a first measurement mode, a second measurement mode, a third measurement mode, and a fourth measurement mode wherein:

in the first measurement mode, the first beam mask component (22) is in the first configuration and the second beam mask component (25) is in the first configuration;

in the second measurement mode, the first beam mask component (22) is in the first configuration and the second beam mask component (25) is in the second configuration; and

in the third measurement mode, the first beam mask component (22) is in the second configuration and the second beam mask component (25) is in the second configuration; and

in a fourth measurement mode, the first beam mask component (22) is in the second configuration and the second beam mask component (25) is in the first configuration.

4. The X-ray analysis apparatus of claim 1, 2 or 3, wherein the controller (17) is configured to calculate a parameter relating to a dimension of the sample and to change the configuration of the first beam mask component (22) and/or the second beam mask component (25) based on the calculated parameter.

5. The X-ray analysis apparatus of claim 4, wherein the X-ray analysis apparatus further comprises an X-ray detector (14), and the controller (17) is configured to carry out a parameter calculation procedure to calculate a first dimension of the sample (6) by:

controlling the X-ray analysis apparatus (2) to move the sample (6) relative to the incident X-ray beam;

detecting a first edge of the sample by detecting a first change in the intensity of the X-rays;

detecting a second edge of the sample by detecting a second change in the intensity of X-rays;

calculating the first dimension of the sample by calculating the distance between the first edge and the second edge.

6. The X-ray analysis apparatus (2) of claim 5 wherein the controller (17) is configured to control the first beam mask component actuator (225) to move the first beam mask component (22) to the first configuration before carrying out the parameter calculation procedure and to control the second beam mask component actuator (255) to move the second beam mask component (25) to the first configuration before carrying out the parameter calculation procedure.

7. The X-ray analysis apparatus of claim 6 wherein the controller (17) is configured to:

control the first beam mask component actuator (225) to move the first beam mask component (22) to the second configuration after carrying out the parameter calculation procedure; and

preferably control the second beam mask component actuator (225) to move the second beam mask component (22) to the second configuration after carrying out the parameter calculation procedure.

8. The X-ray analysis apparatus (2) of claim 1 further comprising a camera arranged to image the sample, wherein the controller (17) is configured to:

control the camera to take an image of the sample (6); and

analyse the image of the sample to calculate a dimension of the sample.

9. The X-ray analysis apparatus (2) of claim 5 wherein the X-ray detector (14) is arranged to receive X-rays from the sample and comprises an adjustable slit (11) arranged between the sample (6) and the X-ray detector (14), wherein the controller (17) is configured to control the opening of the adjustable slit (11).

10. The X-ray analysis apparatus (2) of claim 1 further comprising an adjustable divergence slit (9) for limiting the divergence of the incident X-ray beam, wherein the adjustable divergence slit is arranged in the incident X-ray beam path, and wherein the controller (17) is configured to control the opening of the adjustable divergence slit (9).

11. The X-ray analysis apparatus (2) of claim 5, wherein the controller (17) is configured to carrying out a second parameter measurement procedure to calculate a second dimension of the sample, wherein the second parameter measurement procedure comprises:

controlling the X-ray analysis apparatus (2) to rotate the sample from a first position to a second position;

controlling the X-ray analysis apparatus (2) to move the sample (6) relative to the incident X-ray beam, in a direction substantially parallel to the second dimension;

detecting a third edge of the sample by detecting a first change in the intensity of X-rays;

detecting a fourth edge of the sample by detecting a second change in the intensity of X-rays;

calculating the second dimension of the sample by calculating the distance between the third edge and the fourth edge;

controlling the X-ray analysis apparatus (2) to rotate the sample from the second position to the first position.

12. The X-ray analysis apparatus (2) of claim 9 wherein the controller (17) is configured to control the opening of the adjustable slit (11) based on the dimension of the sample calculated by the controller (17).

13. The X-ray analysis apparatus (2) of claim 1 wherein the first beam mask component (22) is moveable between the first configuration and the second configuration by rotating the first beam mask component (22), and preferably wherein the second beam mask component (25) is moveable between the first configuration and the second configuration by rotating the second beam mask component (25).

14. The X-ray analysis apparatus of claim 1 wherein the first beam mask component (22) comprises at least two openings for limiting the size and/or divergence of the incident X-ray beam and optionally wherein the second beam mask component (25) comprises at least two openings for limiting the size and/or divergence of the incident X-ray beam.

15. The X-ray analysis apparatus (2) of claim 1 wherein the first beam mask component (22) and/or the second beam mask component (25) is arranged to move in a plane substantially perpendicular to the incident X-ray beam.

16. A method of using the X-ray analysis apparatus (2) of claim 1, comprising carrying out a parameter calculation procedure (30) by:

moving the sample (6) relative to the incident X-ray beam;

detecting a first edge of the sample (6) by detecting a first change in the intensity of X-rays;

detecting a second edge of the sample (6) by detecting a second change in the intensity of X-rays;

calculating a dimension of the sample by calculating the distance between the first edge and the second edge.

17. The method of claim 16 further comprising, after carrying out the parameter calculation procedure, positioning the second beam mask component (22) in the second configuration.

18. The method of claim 16 further comprising, after carrying out the parameter calculation procedure, selecting a first beam mask component (22) configuration based on the calculated parameter and positioning the first beam mask component (22) in the selected configuration, and preferably selecting a second beam mask component (25) configuration based on the parameter and positioning the second beam mask component (25) in the selected configuration.

19. The method of claim 16, further comprising controlling the X-ray analysis apparatus to adjust the opening of the adjustable slit (11), based on the dimension calculated by the controller.

20. The method of claim 16, further comprising controlling the X-ray analysis apparatus to adjust the opening of the adjustable divergence slit (9), based on the first dimension and/or a second dimension calculated by the controller.