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CONFIGURING OPTICAL LAYERS IN IMPRINT LITHOGRAPHY PROCESSES

  • US 20190317399A1
  • Filed: 06/27/2019
  • Published: 10/17/2019
  • Est. Priority Date: 02/01/2017
  • Status: Active Grant
First Claim
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1. An imprint lithography method of configuring an optical layer, the imprint lithography method comprising:

  • depositing a set of droplets onto a substrate along a side of the substrate in a manner such that the set of droplets contacts the substrate but does not contact a functional pattern formed on the substrate; and

    curing the set of droplets to form a spacer layer associated with the side of the substrate and of a height selected such that the spacer layer can support a surface adjacent the substrate and spanning the set of droplets at a position spaced apart from the functional pattern.

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