PROCESSING APPARATUS AND METHOD FOR CONTROLLING PROCESSING APPARATUS

• US 20190318914A1
• Filed: 04/09/2019
• Published: 10/17/2019
• Est. Priority Date: 04/16/2018
• Status: Active Application

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Tokyo Electron Limited
• Inventors: OKUNISHI, Naohiko, NAGAHATA, Hiroshi, ISAGO, Masaru, MURAKAMI, Hiraku
• Application Number:
  US16/378,956
• Publication Number:
  US 20190318914A1
• Time in Patent Office: Days
• CPC Class Codes: H01J 2237/334 Etching
• CPC Class Codes: H01J 37/32091 the radio frequency energy being capacitively coupled to the plasma
• CPC Class Codes: H01J 37/32183 Matching circuits
• CPC Class Codes: H01J 37/32568 Relative arrangement or disposition of electrodes; moving means
• CPC Class Codes: H01L 21/67069 for drying etching

Abstract

A processing apparatus that processes an substrate inside a processing container includes a first electrode disposed inside the processing container, the first electrode being configured to mount the substrate, a second electrode disposed so as to face the first electrode, an electric power supply unit configured to apply high frequency power to the first electrode or the second electrode, a coil disposed on a surface opposite to the surface to which the first electrode or the second electrode faces and on a surface of any one of the first electrode and the second electrode, one end of the coil being connected to the any one of the the first electrode and the second electrode, another end of the coil being connected to ground, and an adjusting mechanism configured to control a magnetic field strength of a magnetic field that is from the coil and passes through the coil.

Claims

1. A processing apparatus that processes a substrate inside a processing container, the processing apparatus comprising:

a first electrode disposed inside the processing container, the first electrode being configured to mount the substrate on it;

a second electrode disposed so as to face the first electrode;

an electric power supply unit configured to apply high frequency power to the first electrode or the second electrode;

a coil disposed on a surface opposite to the surface to which the first electrode or the second electrode faces and on a surface of any one of the first electrode and the second electrode, one end of the coil being connected to the any one of the the first electrode and the second electrode, another end of the coil being connected to ground; and

an adjusting mechanism configured to control a magnetic field strength of a magnetic field that is from the coil and passes through the coil.

3. The processing apparatus according to claim 1,

wherein one end of the coil is connected to the electrode through a feed line of the electric power supply unit.

4. The processing apparatus according to claim 1,

wherein the coil includes a plurality of coils, and

wherein the plurality of coils are arranged like any one of a concentric circle, a grid, a triangle, and a honeycomb.

5. The processing apparatus according to claim 4,

wherein the adjusting mechanism is provided between the electrode and the plurality of coils or between the plurality of coils and a ground.

6. The processing apparatus according to claim 4,

wherein the adjusting mechanism includes a switch circuit switching between conduction and insulation of each of the plurality of coils.

7. The processing apparatus according to claim 4,

wherein the adjusting mechanism includes an impedance adjusting circuit that adjusts an impedance of each of the plurality of coils.

8. The processing apparatus according to claim 4,

wherein the adjusting mechanism includes

a first driving mechanism configured to cause each of the plurality of coils to independently move in a height direction to adjust a distance between each of the plurality of coils and the electrode.

9. The processing apparatus according to claim 4,

wherein the adjusting mechanism includes

a second driving mechanism configured to cause a center axis of each of the plurality of coils to independently rotate on a plane vertical to the ceiling portion of the processing container so as to adjust an angle of the center axis relative to the ceiling portion for each of the plurality of coils.

10. The processing apparatus according to claim 4,

wherein the adjusting mechanism includes

a third driving mechanism configured to cause each of the plurality of coils to independently expand or contract so as to adjust a length of each of the plurality of coils.

11. The processing apparatus according to claim 4,

wherein a rod-like member made with a magnetic material is disposed inside each of the plurality of coils.

12. The processing apparatus according to claim 11,

wherein the adjusting mechanism includes

a fourth driving mechanism configured to cause the rod-like member to be inserted into and extracted from each of the plurality of coils.

13. The processing apparatus according to claim 1,

wherein the electric power supply unit applies the high frequency power to the second electrode.

2. A processing apparatus including:

a processing container, in which a substrate is processed;

an electrode that is disposed on a ceiling portion of the processing container or inside the processing container, a mounting stage for mounting the substrate functioning as the electrode;

an electric power supply unit configured to apply high frequency power to the electrode;

a coil disposed on the ceiling portion or an opposite surface of the mounting stage opposite to a processing space surface of the mounting stage on a side of a processing space, one end of the coil being connected to the electrode and another end of the coil being connected to a ground; and

an adjusting mechanism configured to control magnetic field strength of a magnetic field generated by the coil and passes through the coil.

14. A method for controlling a processing apparatus that processes an substrate inside a processing container including

a first electrode disposed inside the processing container, the first electrode being configured to mount the substrate on it,

a second electrode disposed so as to face the first electrode,

an electric power supply unit configured to apply high frequency power to the first electrode or the second electrode,

a coil disposed on a surface opposite to the surface to which the first electrode or the second electrode faces and on a surface of any one of the first electrode and the second electrode, one end of the coil being connected to the any one of the the first electrode and the second electrode, another end of the coil being connected to ground, and

an adjusting mechanism configured to control a magnetic field strength of a magnetic field that is from the coil and passes through the coil, the method comprising:

controlling at least one of a position, an angle, a length, and an impedance of each of the plurality of coils using the adjusting mechanism.

15. The method according to claim 14,

wherein the adjusting mechanism has a switch circuit switching between conduction and insulation of each of the plurality of coils, and

wherein the controlling the at least one of the position, the angle, the length, and the impedance of each of the plurality of coils uses the switch circuit to switch between conduction and insulation of each of the plurality of coils.

16. The method according to claim 14,

wherein the adjusting mechanism includes an impedance adjusting circuit that adjusts an impedance of each of the plurality of coils, and

wherein the controlling the at least one of the position, the angle, the length, and the impedance of each of the plurality of coils uses the impedance adjusting circuit to adjust the impedance of each of the plurality of coils.

17. The method according to claim 14,

wherein the adjusting mechanism includes a first driving mechanism configured to cause each of the plurality of coils to independently move in a height direction to adjust a distance between each of the plurality of coils and the electrode, and

wherein the controlling the at least one of the position, the angle, the length, and the impedance of each of the plurality of coils uses the first driving mechanism to control the position of each of the plurality of coils.

18. The method according to claim 14,

wherein the adjusting mechanism includes a second driving mechanism configured to cause a center axis of each of the plurality of coils to independently rotate on a plane vertical to the ceiling portion of the processing container so as to adjust an angle of the center axis relative to the ceiling portion for each of the plurality of coils, and

wherein the controlling the at least one of the position, the angle, the length, and the impedance of each of the plurality of coils uses the second driving mechanism to control the angle of each of the plurality of coils.

19. The method according to claim 14,

wherein the adjusting mechanism includes a third driving mechanism configured to cause each of the plurality of coils to independently expand or contract so as to adjust a length of each of the plurality of coils, and

wherein the controlling the at least one of the position, the angle, the length, and the impedance of each of the plurality of coils uses the third driving mechanism to control the length of each of the plurality of coils.

20. The method according to claim 14,

wherein the adjusting mechanism includes a fourth driving mechanism configured to cause the rod-like member to be inserted into and extracted from each of the plurality of coils, and

wherein the controlling the at least one of the position, the angle, the length, and the impedance of each of the plurality of coils uses the fourth driving mechanism to control the insertion and extraction of each of the plurality of coils.