QUALITY INSPECTION METHOD FOR CHEMICAL LIQUID
First Claim
1. A quality inspection method for a chemical liquid used for manufacturing a semiconductor substrate, comprising:
- a step W of preparing a first container having a liquid contact portion of which at least a portion is formed of at least one kind of material selected from the group consisting of glass, a fluorine-containing polymer, and electropolished stainless steel, adopting a portion of the chemical liquid as a liquid, and washing at least a portion of the liquid contact portion by using a liquid;
a step A of adopting a portion of the chemical liquid as b liquid and performing concentration of b liquid by using the washed first container so as to obtain c liquid;
a step B of performing measurement of a content of a specific component in c liquid; and
a step C of comparing the content of the specific component with a preset standard value,wherein the step W, the step A, the step B, and the step C are performed in this order,at least the step W and the step A are performed in a clean room having cleanliness equal to or higher than class 4 specified in the International Standard ISO14644-1;
2015 established by the International Organization for Standardization,the concentration is performed under at least one kind of inert gas selected from the group consisting of an Ar gas, a He gas, and a N2 gas or under reduced pressure, andthe measurement is performed by at least one kind of measurement method selected from the group consisting of gas chromatography mass spectrometry, gas chromatography tandem mass spectrometry, gas chromatography atomic emission detection, gas chromatography quadrupole time-of-flight type mass spectrometry, direct sample introduction-type mass spectrometry, high-performance liquid chromatography mass spectrometry, high-performance liquid chromatography tandem mass spectrometry, high-performance liquid chromatography time-of-flight type mass spectrometry, inductively coupled plasma mass spectrometry, inductively coupled plasma emission spectrometry, temperature programmed desorption mass spectrometry, ion chromatography, nuclear magnetic resonance spectrometry, and atomic absorption spectrometry.
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Abstract
An object of the present invention is to provide a quality inspection method for a chemical liquid that makes it possible to simply evaluate defect performance.
The quality inspection method according to an embodiment of the present invention is a quality inspection method for a chemical liquid used for manufacturing a semiconductor substrate, including a step W of preparing a first container and washing at least a portion of a liquid contact portion by using a portion of the chemical liquid, a step A of performing concentration of a portion of the chemical liquid by using the washed first container so as to obtain c liquid, a step B of performing measurement of a content of a specific component in c liquid, and a step C of comparing the content of the specific component with a preset standard value. The step W, the step A, the step B, and the step C are performed in this order, at least the step W and the step A are performed in a clean room having cleanliness equal to or higher than class 4 specified in ISO14644-1:2015, the concentration is performed in at least one kind of inert gas selected from the group consisting of an Ar gas, a He gas, and a N2 gas or under reduced pressure, and the measurement is performed by a predetermined measurement method.
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Citations
31 Claims
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1. A quality inspection method for a chemical liquid used for manufacturing a semiconductor substrate, comprising:
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a step W of preparing a first container having a liquid contact portion of which at least a portion is formed of at least one kind of material selected from the group consisting of glass, a fluorine-containing polymer, and electropolished stainless steel, adopting a portion of the chemical liquid as a liquid, and washing at least a portion of the liquid contact portion by using a liquid; a step A of adopting a portion of the chemical liquid as b liquid and performing concentration of b liquid by using the washed first container so as to obtain c liquid; a step B of performing measurement of a content of a specific component in c liquid; and a step C of comparing the content of the specific component with a preset standard value, wherein the step W, the step A, the step B, and the step C are performed in this order, at least the step W and the step A are performed in a clean room having cleanliness equal to or higher than class 4 specified in the International Standard ISO14644-1;
2015 established by the International Organization for Standardization,the concentration is performed under at least one kind of inert gas selected from the group consisting of an Ar gas, a He gas, and a N2 gas or under reduced pressure, and the measurement is performed by at least one kind of measurement method selected from the group consisting of gas chromatography mass spectrometry, gas chromatography tandem mass spectrometry, gas chromatography atomic emission detection, gas chromatography quadrupole time-of-flight type mass spectrometry, direct sample introduction-type mass spectrometry, high-performance liquid chromatography mass spectrometry, high-performance liquid chromatography tandem mass spectrometry, high-performance liquid chromatography time-of-flight type mass spectrometry, inductively coupled plasma mass spectrometry, inductively coupled plasma emission spectrometry, temperature programmed desorption mass spectrometry, ion chromatography, nuclear magnetic resonance spectrometry, and atomic absorption spectrometry. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31)
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Specification