SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
First Claim
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1. A method of fabricating a semiconductor device comprising:
- forming a channel hole penetrating a molded structure formed on a substrate;
forming a preliminary channel layer on a side surface of the channel hole;
forming a preliminary filling layer on the preliminary channel layer to fill the channel hole;
forming a first recess in the channel hole by removing a part of each of the preliminary channel layer and the preliminary filling layer, wherein a channel layer and a filling layer are formed in the forming of the first recess;
forming a spacer on a side surface of the first recess, the spacer having a bottom hole exposing an upper surface of the filling layer;
removing the filling layer completely via the bottom hole;
forming a preliminary passivation layer to fill the bottom hole;
forming a second recess by removing a part of the preliminary passivation layer and a part of the spacer; and
forming a pad to fill the second recess.
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Abstract
A stack structure includes conductive layer patterns and interlayer insulating layer patterns alternately stacked on one another. A channel hole penetrates the stack structure. A dielectric layer is disposed on a sidewall of the channel hole. A channel layer is disposed on the dielectric layer and in the channel hole. A passivation layer is disposed on the channel layer and in the channel hole. The channel layer is interposed between the passivation layer and the dielectric layer. An air gap is surrounded by the passivation layer. A width of the air gap is larger than a width of the passivation layer.
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Citations
14 Claims
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1. A method of fabricating a semiconductor device comprising:
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forming a channel hole penetrating a molded structure formed on a substrate; forming a preliminary channel layer on a side surface of the channel hole; forming a preliminary filling layer on the preliminary channel layer to fill the channel hole; forming a first recess in the channel hole by removing a part of each of the preliminary channel layer and the preliminary filling layer, wherein a channel layer and a filling layer are formed in the forming of the first recess; forming a spacer on a side surface of the first recess, the spacer having a bottom hole exposing an upper surface of the filling layer; removing the filling layer completely via the bottom hole; forming a preliminary passivation layer to fill the bottom hole; forming a second recess by removing a part of the preliminary passivation layer and a part of the spacer; and forming a pad to fill the second recess. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method of fabricating a semiconductor device comprising:
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forming a channel hole penetrating a molded structure formed on a substrate; forming a preliminary channel layer on a side surface of the channel hole; forming a preliminary filling layer on the preliminary channel layer to fill the channel hole; forming a first recess in the channel hole by removing a part of each of the preliminary channel layer and the preliminary filling layer, wherein a channel layer and a filling layer are formed in the forming of the first recess; forming a spacer on a side surface of the first recess, the spacer having a bottom hole exposing an upper surface of the filling layer; removing the filling layer completely via the bottom hole; and forming a preliminary passivation layer in the bottom hole and the channel hole, wherein an air gap is formed to be surrounded by the preliminary passivation layer in the channel hole. - View Dependent Claims (11, 12, 13, 14)
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Specification