MAGNETIC TUNNEL JUNCTION WITH ANISOTROPY OF PERPENDICULAR FORM AND VARIABILITY, MEMORY POINT AND LOGICAL ELEMENT COMPRISING THE MAGNETIC TUNNEL JUNCTION, METHOD OF MANUFACTURING THE MAGNETIC TUNNEL JUNCTION
First Claim
1. Magnetic random access memory point of SOT-MRAM type comprising:
- an electrical contact layer,a magnetic tunnel junction with out-of-plane magnetisation including;
a storage layer having a magnetisation switchable between two magnetisation states normal to the plane of the layer;
a reference layer having a fixed magnetisation and normal to the plane of the reference layer;
a tunnel barrier layer separating the storage layer and the reference layer;
a metal line parallel to the plane of the layers and in contact with the storage layer including at least one second electrical contact,the two magnetisation states of the storage layer being separated by an energy barrier, said magnetic tunnel junction having a thermal stability factor dependent on the energy barrier and on the temperature of use of the magnetic tunnel junction, wherein;
the storage layer has a thickness comprised between 0.5 times and 8 times a characteristic dimension of a planar section of the tunnel junction;
a composition and a thickness of the storage layer are chosen such that the absolute value of the derivative of the thermal stability factor compared to a characteristic dimension of a planar section of the tunnel junction is less than 10 nm−
1, the derivative of the thermal stability factor being calculated at a temperature Tm, the temperature Tm being the average temperature of use of the magnetic tunnel junction.
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Accused Products
Abstract
A magnetic tunnel junction with out-of-plane magnetisation includes a storage layer; a reference layer; a tunnel barrier layer, the two magnetisation states of the storage layer being separated by an energy barrier, the magnetic tunnel junction having a thermal stability factor dependent on the energy barrier and on the temperature of use of the magnetic tunnel junction. The storage layer has a thickness comprised between 0.5 times and 8 times a characteristic dimension of a planar section of the tunnel junction; the composition and the thickness of the storage layer are chosen such that the absolute value of the derivative of the thermal stability factor compared to a characteristic dimension of a planar section of the tunnel junction is less than 10 nm−1.
3 Citations
15 Claims
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1. Magnetic random access memory point of SOT-MRAM type comprising:
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an electrical contact layer, a magnetic tunnel junction with out-of-plane magnetisation including; a storage layer having a magnetisation switchable between two magnetisation states normal to the plane of the layer; a reference layer having a fixed magnetisation and normal to the plane of the reference layer; a tunnel barrier layer separating the storage layer and the reference layer; a metal line parallel to the plane of the layers and in contact with the storage layer including at least one second electrical contact, the two magnetisation states of the storage layer being separated by an energy barrier, said magnetic tunnel junction having a thermal stability factor dependent on the energy barrier and on the temperature of use of the magnetic tunnel junction, wherein; the storage layer has a thickness comprised between 0.5 times and 8 times a characteristic dimension of a planar section of the tunnel junction; a composition and a thickness of the storage layer are chosen such that the absolute value of the derivative of the thermal stability factor compared to a characteristic dimension of a planar section of the tunnel junction is less than 10 nm−
1, the derivative of the thermal stability factor being calculated at a temperature Tm, the temperature Tm being the average temperature of use of the magnetic tunnel junction. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 14, 15)
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12. Method for manufacturing a magnetic tunnel junction with out-of-plane magnetisation including a storage layer having a magnetisation switchable between two magnetisation states normal to the plane of the layer, the two magnetisation states of the storage layer being separated by an energy barrier, said storage layer having a thickness comprised between 0.5 times and 8 times a characteristic dimension D of a planar section of the tunnel junction, said magnetic tunnel junction having a thermal stability factor Δ
- dependent on the energy barrier and on the average temperature of use of the magnetic tunnel junction T, said method comprising;
calculating the optimal thickness Lopti of the storage layer using the formula; - View Dependent Claims (13)
- dependent on the energy barrier and on the average temperature of use of the magnetic tunnel junction T, said method comprising;
Specification