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SUBSTRATE PROCESSING APPARATUS AND METHOD

  • US 20190330740A1
  • Filed: 04/30/2018
  • Published: 10/31/2019
  • Est. Priority Date: 04/30/2018
  • Status: Active Application
First Claim
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1. A substrate processing apparatus comprising:

  • a reaction chamber;

    a substrate holder constructed and arranged to hold at least one substrate in said reaction chamber; and

    ,a gas injector system constructed and arranged to provide a process gas to the interior of the reaction chamber and provided with a gas control system constructed and arranged to control the process gas flow from a source pipe;

    wherein the gas injector system comprises a first and second injector for the same process gas and the gas control system is constructed, arranged, and/or programmed to provide the flow of the process gas from the source pipe to one of the first and second injectors while restricting a flow of the same process gas to another of the first and second injectors.

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