A SUBSTRATE HOLDER AND A METHOD OF MANUFACTURING A SUBSTRATE HOLDER

• US 20190332015A1
• Filed: 07/06/2017
• Published: 10/31/2019
• Est. Priority Date: 07/06/2016
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Holding NV, ASML Netherlands BV (ASML Holding NV)
• Inventors: POIESZ, Thomas, ACHANTA, Satish, AKBAS, Mehmet Ali, ANTONOV, Pavlo, BOUWKNEGT, Jeroen, FRENKEN, Joost Wilhelmus Maria, PACITTI, Evelyn Wallis, TEN KATE, Nicolaas, TIRRI, Bruce, VERHOEVEN, Jan
• Granted Patent: US 10,719,019 B2
• Time in Patent Office: Days
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/70783 Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
• CPC Class Codes: H01L 21/6875 characterised by a plurality of individual support members, e.g. support posts or protrusions
• CPC Class Codes: H01L 21/68757 characterised by a coating or a hardness or a material

Abstract

There is disclosed a substrate holder, a method of manufacturing a substrate holder, a lithographic apparatus comprising the substrate holder, and a method of manufacturing devices using the lithographic apparatus. In one arrangement, there is provided a substrate holder for use in a lithographic apparatus. The substrate holder supports a substrate. The substrate holder comprises a main body. The main body has a main body surface. A plurality of burls are provided projecting from the main body surface. Each burl has a burl side surface and a distal end surface. The distal end surface of each burl engages with the substrate. The distal end surfaces of the burls substantially conform to a support plane and support the substrate. A layer of carbon based material is provided in a plurality of separated regions of carbon based material. The layer of carbon based material provides a surface with a lower coefficient of friction than a part of the main body surface outside the plurality of separated regions of carbon based material. The layer of carbon based material covers only part of the distal end surface of at least one of the burls. Alternatively, the layer of carbon based material covers the distal end surface and at least a portion of the burl side surface of at least one of the burls.

Claims

1-15. -15. (canceled)

16. A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder comprising:

a main body having a main body surface;

a plurality of burls projecting from the main body surface, wherein

each burl has a burl side surface and a distal end surface, wherein the distal end surface is configured to engage with the substrate;

the distal end surfaces of the burls substantially conform to a support plane and are configured for supporting the substrate;

wherein

a continuous layer of carbon based material is provided, the continuous layer comprising a plurality of first regions each having a first thickness and at least one second region having a second thickness, the carbon based material providing a surface with a lower coefficient of friction than the main body surface, the plurality of first regions together covering a surface portion of at least one of the burls, the first thickness being larger than the second thickness, and the second thickness being less than 300 nm.

17. The substrate holder of claim 16 wherein the plurality of first regions covers only part of the distal end surface of at least one of the burls.

18. The substrate holder of claim 17, wherein the first thickness is in the range from 0.5 μ

m to 1.5 μ

m, and the second thickness is in the range from 200 nm to 300 nm.

19. The substrate holder of claim 16 wherein the plurality of first regions covers the distal end surface and at least a portion of the burl side surface of at least one of the burls.

20. The substrate holder of claim 19, wherein the first thickness is in the range from 0.5 μ

m to 1.5 μ

m, and the second thickness is in the range from 200 nm to 300 nm.

21. The substrate holder of claim 16 wherein the carbon based material is diamond-like carbon.

22. The substrate holder of claim 17 wherein the carbon based material is diamond-like carbon.

23. The substrate holder of claim 18 wherein the carbon based material is diamond-like carbon.

24. The substrate holder of claim 16 wherein each of the plurality of first regions covers the burl side surface, the distal end surface, and a portion of the main body surface directly adjacent to the burl side surface, of at least one of the burls.

25. The substrate holder of claim 16 wherein each of one or more of the plurality of first regions covers a portion of the burl side surface and the distal end surface of a single burl.

26. The substrate holder of claim 25, wherein each of the plurality of first regions that covers a portion of the burl side surface and the distal end surface of a single burl has, when viewed perpendicularly to the main body surface, a maximum lateral dimension that is less than the distance between the center of the burl and the center of a nearest other burl.

27. The substrate holder of claim 16 wherein the plurality of first regions covers the distal end surface of each of the plurality of burls projecting from the main body surface.

28. The substrate holder of claim 16 further comprising a seal projecting from the main body surface, the seal having a seal end surface, wherein the plurality of first regions covers the seal end surface.

29. A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder comprising:

a main body having a main body surface;

a plurality of burls projecting from the main body surface, wherein

each burl has a burl side surface and a distal end surface, wherein the distal end surface is configured to engage with the substrate;

the distal end surfaces of the burls substantially conforming to a support plane and being configured for supporting the substrate;

wherein

a layer of carbon based material is provided in a plurality of separated regions of carbon based material, the layer of carbon based material providing a surface with a lower coefficient of friction than a part of the main body surface outside the plurality of separated regions of carbon based material; and

the layer of carbon based material covers the distal end surface and at least a portion of the burl side surface of at least one of the burls, and wherein each of the separated regions is provided on multiple burls.

30. The substrate holder of claim 29, wherein the layer of carbon based material has a thickness in the range from 0.5 μ

m to 1.5 μ

m.

31. A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder comprising:

a main body having a main body surface;

a plurality of burls projecting from the main body surface, wherein

each burl has a burl side surface and a distal end surface, wherein the distal end surface is configured to engage with the substrate;

the distal end surfaces of the burls substantially conforming to a support plane and being configured for supporting the substrate;

wherein

a layer of carbon based material is provided in a plurality of separated regions of carbon based material, the layer of carbon based material providing a surface with a lower coefficient of friction than a part of the main body surface outside the plurality of separated regions of carbon based material; and

the layer of carbon based material covers only part of the distal end surface of at least one of the burls, wherein the layer of carbon based material has a thickness in the range from 0.5 μ

m to 1.5 μ

m.

32. A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder comprising:

a main body having a main body surface;

a plurality of burls projecting from the main body surface, wherein

each burl has a burl side surface and a distal end surface, wherein the distal end surface is configured to engage with the substrate;

the distal end surfaces of the burls substantially conforming to a support plane and being configured for supporting the substrate;

wherein

a layer of carbon based material is provided as a plurality of separated regions of carbon based material, the layer of carbon based material providing a surface with a lower coefficient of friction than a part of the main body surface outside the plurality of separated regions of carbon based material; and

the layer of carbon based material covers only part of the distal end surface of at least one of the burls, wherein the carbon based material comprises graphene.

33. The substrate holder of claim 32 wherein each burl comprises a plurality of SiC grains in a silicon matrix, and the part of the distal end surface of each burl that is covered by the carbon based material comprises surfaces of SiC grains on the distal end surface of the burl.

34. A method of manufacturing a substrate holder, the method comprising:

providing a substrate holder blank having a main body with a main body surface, and having a plurality of burls projecting from the main body surface, wherein each burl has a burl side surface and a distal end surface, wherein the distal end surface is configured to engage with a substrate and the distal end surfaces of the burls substantially conform to a support plane and are configured for supporting a substrate;

providing a continuous layer of carbon based material, the continuous layer comprising a plurality of first regions each having a first thickness and at least one second region having a second thickness, the layer of carbon based material providing a surface with a lower coefficient of friction than the main body surface,

wherein the providing of the continuous layer of carbon based material comprises;

providing a layer of carbon based material having the first thickness on at least part of the main body surface and the plurality of burls; and

selectively reducing the thickness of the carbon based material in the at least one second region to form the continuous layer of carbon based material.

35. A method of manufacturing a substrate holder, the method comprising:

providing a substrate holder having a main body with a main body surface, and having a plurality of burls projecting from the main body surface, wherein each burl has a burl side surface and a distal end surface, wherein the distal end surface is configured to engage with a substrate and the distal end surfaces of the burls substantially conform to a support plane and are configured for supporting a substrate;

submerging at least part of the substrate holder in a hydrogen atmosphere;

irradiating a plurality of separated regions on the at least part of the substrate holder using a radiation beam so as to form a layer of graphene in the plurality of separated regions, the plurality of separated regions being positioned such that the layer of graphene covers only part of the distal end surface of at least one of the burls.