TRANSPARENT ELECTRODE, MANUFACTURING METHOD THEREOF AND ELECTRONIC DEVICE EMPLOYING THE TRANSPARENT ELECTRODE

• US 20190378940A1
• Filed: 08/22/2019
• Published: 12/12/2019
• Est. Priority Date: 07/21/2017
• Status: Active Grant

• Current Assignee: Kabushiki Kaisha Toshiba (Toshiba Corporation)
• Original Assignee: Kabushiki Kaisha Toshiba (Toshiba Corporation)
• Inventors: SHIDA, Naomi, NAITO, Katsuyuki, SAITO, Mitsunaga, NIIMOTO, Takeshi
• Granted Patent: US 10,644,172 B2
• Time in Patent Office: Days
• CPC Class Codes: G02F 1/13439 characterised by their electrical, optical, physical properties; materials therefor; method of making
• CPC Class Codes: H01L 29/401 Multistep manufacturing processes
• CPC Class Codes: H01L 31/022425 for solar cells
• CPC Class Codes: H01L 31/022475 composed of indium tin oxide [ITO]
• CPC Class Codes: H01L 31/022483 composed of zinc oxide [ZnO]
• CPC Class Codes: H10K 2102/103 comprising indium oxides, e.g. ITO
• CPC Class Codes: H10K 30/82 Transparent electrodes, e.g. indium tin oxide [ITO] electrodes
• CPC Class Codes: H10K 50/15 Hole transporting layers
• CPC Class Codes: H10K 50/816 Multilayers, e.g. transparent multilayers
• CPC Class Codes: H10K 71/00 Manufacture or treatment specially adapted for the organic devices covered by this subclass
• CPC Class Codes: Y02E 10/549 Organic PV cells
• CPC Class Codes: Y02P 70/50 Manufacturing or production processes characterised by the final manufactured product

Abstract

The present embodiments provide a transparent electrode having a laminate structure of:

• • a first metal oxide layer having an amorphous structure and electroconductivity,
  • a metal layer made of a metallic material containing silver or copper,
  • a second metal oxide layer having an amorphous structure and electroconductivity, and
  • a third metal oxide layer having an amorphous structure and continuity, stacked in this order.

Claims

1-18. -18:

(canceled)

19. :

A method for manufacturing an electronic device, the method comprising;

(I) preparing a transparent substrate,

(II) preparing a laminate structure of

a first metal oxide layer having an amorphous structure and electroconductivity,

a metal layer which comprises a metallic material containing silver or copper, and

a second metal oxide layer having an amorphous structure and electroconductivity,

on said transparent substrate,

(III) forming a third metal oxide layer having an amorphous structure and continuity on a surface of said second metal oxide layer,

(IV) forming a photoelectric conversion layer on a surface of said third metal oxide layer, and

(V) forming a counter electrode on a surface of said photoelectric conversion layer.

20. :

The method according to claim 19, further comprising;

(IIIa) forming a graphene layer which is placed in direct contact with said third metal oxide layer before or after the forming (III).

21. :

The method according to claim 19, further comprising forming a charge buffer layer or a charge transport layer between said photoelectric conversion layer and said third metal oxide layer or between said photoelectric conversion layer and said counter electrode.

22. :

The method according to claim 19, wherein the forming (III) comprises coating a metal alkoxide solution on the surface of said second metal oxide layer and drying.

23. :

The method according to claim 20, wherein the forming (IIIa) comprises coating an aqueous solution of graphene oxide to form a coated film and then treating said coated film with hydrazine hydrate to form said graphene layer.

24. :

The method according to claim 20, wherein the forming (IIIa) comprises forming said graphene layer on a copper foil by a CVD process and then transferring said graphene layer.

25. :

The method according to claim 19, wherein said counter electrode is formed by lamination in the forming (V).

26. :

The method according to claim 22, wherein said metal alkoxide solution further comprises other ion having a valence different from a metal constituting said metal oxide.

27. :

The method according to claim 19, further comprising;

forming a UV-cut layer or a gas-barrier layer.