METHOD FOR STRUCTURING A SUBSTRATE, ASSEMBLY COMPRISING A SUBSTRATE AND A DEVICE FOR STRUCTURING SAID SUBSTRATE, AND SUBSTRATE WITH SUCH A STRUCTURE

• US 20200130099A1
• Filed: 06/26/2018
• Published: 04/30/2020
• Est. Priority Date: 06/27/2017
• Status: Active Grant

• Current Assignee: Laser Engineering Applications
• Original Assignee: Laser Engineering Applications
• Inventors: Martin, Paul-Etienne, Henrottin, Anne, Estival, Sebastien, Kupisiewicz, Axel Stefan M., Ramos De Campos, Jose
• Granted Patent: US 11,267,072 B2
• Time in Patent Office: Days
• CPC Class Codes: B23K 2101/38 Conductors
• CPC Class Codes: B23K 2103/04 Steel or steel alloys
• CPC Class Codes: B23K 2103/08 Non-ferrous metals or alloys
• CPC Class Codes: B23K 2103/18 Dissimilar materials
• CPC Class Codes: B23K 2103/42 Plastics B23K2103/16 takes precedence
• CPC Class Codes: B23K 2103/50 Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
• CPC Class Codes: B23K 2103/54 Glass
• CPC Class Codes: B23K 26/0006 taking account of the properties of the material involved B23K26/32, B23K26/40 take precedence
• CPC Class Codes: B23K 26/064 by means of optical elements, e.g. lenses, mirrors or prisms
• CPC Class Codes: B23K 26/0643 comprising mirrors
• CPC Class Codes: B23K 26/0648 comprising lenses
• CPC Class Codes: B23K 26/082 Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
• CPC Class Codes: B23K 26/0853 Devices involving movement of the workpiece in at least in two axial directions, e.g. in a plane
• CPC Class Codes: B23K 26/10 using a fixed support , i.e. involving moving the laser beam
• CPC Class Codes: B23K 26/20 Bonding soldering by means of radiant energy B23K1/005; joining of preformed plastics parts by heating using laser beam B29C65/16
• CPC Class Codes: B23K 26/364 for making a groove or trench, e.g. for scribing a break initiation groove
• CPC Class Codes: B23K 26/402 involving non-metallic material, e.g. isolators
• CPC Class Codes: B23K 26/702 Auxiliary equipment
• CPC Class Codes: B29C 65/1632 direct heating the surfaces to be joined
• CPC Class Codes: B29C 66/028 Non-mechanical surface pre-treatments, i.e. by flame treatment, electric discharge treatment, plasma treatment, wave energy or particle radiation B29C65/14 takes precedence; non-mechanical surface treatment of plastics in general B29C59/08 - B29C59/16
• CPC Class Codes: G02B 19/0009 : having refractive surfaces only
• CPC Class Codes: G02B 19/0047 : for use with a light source G02B19/009, G02B19/0095 take precedence; details of lighting devices in general F21V; non-semiconductor lasers having optical devices external to the laser cavity H01S3/005
• CPC Class Codes: G02B 26/105 : with one or more pivoting mirrors or galvano-mirrors G02B26/101 takes precedence

Abstract

Method for structuring a substrate (11) and comprising the following steps: —providing a device (100) comprising a light source (33), an optical system (2) for obtaining an outgoing light beam (7) spatially offset in relation to the incoming light beam (1), and capable of modifying this spatial offset, focusing means (9) for focusing the outgoing light beam (7), a substrate holder (59), a movement device (60) for generating a movement (41) between the outgoing light beam (7) and the substrate (11); —providing and placing the substrate (11) on the substrate holder (59); —etching the substrate with the focused outgoing light beam (7) having an angle of attack (107) greater than 1° for any spatial offset between outgoing light beam (7) and incoming light beam (1) imposed by the optical system (2).

Claims

1. A method for structuring a substrate having an upper surface and a lower surface, said method comprising the following steps:

a) providing a device comprising;

a light source for generating a structuring incoming light beam capable of machining said upper surface of said substrate;

an optical system for obtaining, from said incoming light beam, an outgoing light beam spatially offset in relation to said incoming light beam, said optical system being capable of modifying the spatial offset between said incoming light beam and said outgoing light beam;

focusing means for focusing said outgoing light beam;

a substrate holder;

a movement device for generating a relative movement between said outgoing light beam and said substrate holder;

b) providing and placing said substrate on said substrate holder so as to have towards said focusing means its upper surface characterized by a normal;

c) generating with the light source the incoming light beam;

d) generating from the incoming light beam as it passes through the optical system, then through the focusing means, a focused outgoing light beam describing with said normal of said upper surface of said substrate at a focusing point of said outgoing light beam an angle of attack greater than 1°

, preferably greater than 3°

, for any spatial offset between outgoing light beam and incoming light beam imposed by said optical system;

e) initiating a relative movement between said substrate holder supporting said substrate and said focused outgoing light beam for etching a pattern from the upper surface of said substrate, said formed pattern comprising a cavity in the substrate opening through an opening at the upper surface of the substrate;

defining parameters of said light source according to said relative movement initiated in step e) for generating said incoming light beam such that the cavity of the formed pattern is non-through between said upper surface and said lower surface of said substrate.

2. The method of claim 1, characterized in that the relative movement between said substrate and said outgoing light beam is a relative movement in a plan parallel to the upper surface, so that the focused outgoing light beam can etch a pattern from the upper surface on an essentially flat surface having an area greater than 1 cm².

5. The method of claim 1, characterized in that the spatial offset between the incoming light beam and the outgoing light beam imposed by the optical system is a fixed spatial offset with respect to the focusing means so as to etch a pattern having a cavity comprising:

at its opening on said upper surface of said substrate, a first and a second ends defined in a plan essentially perpendicular to said upper surface of the substrate,

an opening width defined by a distance between said first and second ends of said opening,

a cavity width defined essentially parallel to said opening width which is essentially decreasing from the upper surface along the thickness of the substrate.

8. The method of claim 1, characterized in that said optical system comprises:

a mirror;

having an essentially flat reflection surface defined by a normal for obtaining a first reflected light beam from a first incident light beam from said incoming light beam,

movable;

drive means for moving said movable mirror;

a redirection system;

positioned in relation to said mirror for obtaining from said first reflected light beam a second incident light beam to said mirror, for obtaining said outgoing light beam from a reflection of said second incident light beam on said movable mirror.

9. The method of claim 1, characterized in that said optical system comprises:

a mirror;

having an essentially flat reflection surface defined by a normal for obtaining a first reflected light beam from a first incident light beam from said incoming light beam,

movable such that its normal is capable of describing a trajectory in a three-dimensional space;

said optical system being configured so that said first incident light beam and said normal of said mirror are separated by an angle of between 0° and

15°

for all possible positions and orientations of said movable mirror, preferably between 0.01° and

10° and

even more preferably between 3° and

8°

;

drive means for moving said movable mirror;

a retro-reflection system;

positioned in relation to said mirror for obtaining from said first reflected light beam a second incident light beam to said mirror for all positions and orientations of said mirror for obtaining said outgoing light beam from a reflection of said second incident light beam on said movable mirror, and

capable of providing said second incident light beam on said mirror, parallel to said first reflected light beam for all possible positions and orientations of said movable mirror.

10. The method of claim 9, characterized in that the optical system is configured so that said first incident light beam and said normal of said mirror are separated by an angle of between 0.01°

and 10°

for all possible positions and orientations of said movable mirror, preferably between 0.1° and

8° and

even more preferably between 3° and

8°

.

14. The method of claim 1, characterized in that the angle of attack is between 1°

and 15°

, preferably between 2° and

5°

, more preferably between 3° and

4°

, for any spatial offset between the outgoing light beam and the incoming light beam imposed by said optical system.

15. The method of claim 1, characterized in that said optical system is capable of inducing a precession movement of said focused outgoing light beam in relation to the upper surface of said substrate.

16. A method of assembling a substrate with a piece and comprising the following steps:

structuring an upper surface of the substrate using a method according to any of the preceding claims, for generating a first part of structured upper surface of the substrate comprising a pattern;

providing the piece which have a surface having a second surface part comprising a fusible material having a melting point lower than the melting point of the first part of structured upper surface of the substrate;

placing the first part of structured upper surface of the substrate in contact with the second part of surface of the piece;

applying a pressure to maintain contact between the first part of structured upper surface of the substrate and the second part of surface of the piece;

providing a heater for creating a temperature increase in the fusible material sufficient to melt it; and

heating, by means of the heater, the fusible material so as to reach a temperature in the fusible material sufficient to melt at least a part of it in the pattern of the first part of structured upper surface of the substrate.

3-4. -4. (canceled)

6-7. -7. (canceled)

11-13. -13. (canceled)

17. An assemblage comprising a substrate having an upper surface and a lower surface and a device for structuring said substrate, said device comprising:

a light source for generating a structuring incoming light beam capable of machining said upper surface of said substrate;

an optical system for obtaining, from said incoming light beam, an outgoing light beam spatially offset in relation to said incoming light beam, said optical system being capable of modifying the spatial offset between said incoming light beam and said outgoing light beam;

focusing means for focusing said outgoing light beam;

a substrate holder;

a movement device for generating a relative movement between said outgoing light beam and said substrate holder;

said substrate being placed on said substrate holder so as to have towards said focusing means its upper surface characterized by a normal,

said device being configured so that said focused outgoing light beam and said normal of said upper surface of said substrate at a focusing point of said outgoing light beam are separated by an angle of attack greater than 1°

, preferably greater than 3°

, for any spatial offset between the outgoing light beam and the incoming light beam imposed by said optical system

parameters of said light source are defined according to said relative movement for generating said incoming light beam such that the cavity of the formed pattern is non-through between said upper surface and said lower surface of said substrate.

19. The assemblage of claim 17, characterized in that said movement device is capable of generating said relative movement between said substrate and said outgoing light beam in an area greater than 1 cm², preferably greater than 10 cm² and even more preferably greater than 100 cm², said relative movement being generated in a plan parallel to the upper surface, so that the focused outgoing light beam can etch a pattern from the upper surface.

20. The assemblage of claim 17, characterized in that the device is configured so that said focused outgoing light beam and a normal of said upper surface of said substrate at a focusing point of said outgoing light beam are separated by an angle of attack between 1°

and 15°

, preferably between 2° and

5°

, and even more preferably between 3° and

4°

, for any spatial offset between the outgoing light beam and the incoming light beam imposed by said optical system.

21. The assemblage of claim 17, characterized in that said optical system comprises:

a mirror;

having an essentially flat reflection surface defined by a normal for obtaining a first reflected light beam from a first incident light beam from said incoming light beam,

movable;

drive means for moving said movable mirror;

a redirection system;

positioned in relation to said mirror for obtaining from said first reflected light beam a second incident light beam to said mirror, for obtaining said outgoing light beam from a reflection of said second incident light beam on said movable mirror,

or,

a mirror;

having an essentially flat reflection surface defined by a normal for obtaining a first reflected light beam from a first incident light beam from said incoming light beam,

movable such that its normal is capable of describing a trajectory in a three-dimensional space;

said optical system being configured so that said first incident light beam and said normal of said mirror are separated by an angle of between 0° and

15°

, preferably between 0.01° and

10° and

even more preferably between 3° and

8°

, for all possible positions and orientations of said movable mirror

drive means for moving said movable mirror;

a retro-reflection system;

positioned in relation to said mirror for obtaining from said first reflected light beam, a second incident light beam to said mirror for all positions and orientations of said mirror for obtaining said outgoing light beam from a reflection of said second incident light beam on said movable mirror, and

capable of providing said second incident light beam on said mirror, parallel to said first reflected light beam for all possible positions and orientations of said movable mirror.

22. The assemblage of claim 17, characterized in that the device further comprises a deflection system positioned between said optical system and said focusing means to offset the outgoing light beam.

24. A system for assembling a substrate with a piece comprising a fusible material having a melting point lower than the melting point of said substrate, said system comprising:

an assemblage according to claim 17 for structuring an upper surface of said substrate;

means for contacting said piece with said upper surface of said substrate;

a means of compression;

a heater capable of creating a sufficient temperature increase in said fusible material for melting at least a part of it.

18. (canceled)

23. (canceled)

25-26. -26. (canceled)