DETERMINATION DEVICE FOR DETERMINING AT LEAST ONE PARAMETER OF AN ENERGY BEAM

• US 20200130279A1
• Filed: 03/06/2019
• Published: 04/30/2020
• Est. Priority Date: 10/26/2018
• Status: Active Grant

• Current Assignee: Concept Laser GmbH (GE Aerospace)
• Original Assignee: Concept Laser GmbH (GE Aerospace)
• Inventors: DICKEN, Christian, SCHULZ, Thomas
• Granted Patent: US 11,850,798 B2
• Time in Patent Office: Days
• CPC Class Codes: B23K 26/032 using optical means
• CPC Class Codes: B23K 26/064 by means of optical elements, e.g. lenses, mirrors or prisms
• CPC Class Codes: B23K 26/067 Dividing the beam into multiple beams, e.g. multifocusing
• CPC Class Codes: B23K 26/342 Build-up welding
• CPC Class Codes: B23K 26/705 Beam measuring device
• CPC Class Codes: B28B 1/001 Rapid manufacturing of 3D objects by additive depositing, agglomerating or laminating of material selective deposition modelling of metallic powder B22F10/00; rapid manufacturing of 3D objects in general and in particular of plastics B29C64/00
• CPC Class Codes: B29C 64/268 using laser beams; using electron beams [EB]
• CPC Class Codes: B29C 64/386 Data acquisition or data processing for additive manufacturing
• CPC Class Codes: B33Y 30/00 Apparatus for additive manufacturing; Details thereof or accessories therefor
• CPC Class Codes: B33Y 50/00 Data acquisition or data processing for additive manufacturing
• CPC Class Codes: G01B 11/272 using photoelectric detection means
• CPC Class Codes: Y02P 10/25 Process efficiency

Abstract

Determination device (2) for determining at least one parameter of an energy beam (4), in particular an energy beam (4) generated via an irradiation device of an apparatus (1) for additively manufacturing three-dimensional objects, which determination device (2) comprises two determination units (5, 6) arrangeable or arranged in succession in a beam path (3) of the energy beam (4), characterized in that each determination unit (5, 6) builds or comprises at least one complementary pattern element (15, 18, 21, 23, 24, 27, 30), wherein at least two pattern elements (15, 18, 21, 23, 24, 27, 30) of the two determination units (5, 6) complement each other to a superordinate pattern (32, 35).

Claims

1. Determination device (2) for determining at least one parameter of an energy beam (4), in particular an energy beam (4) generated via an irradiation device of an apparatus (1) for additively manufacturing three-dimensional objects, which determination device (2) comprises two determination units (5, 6) arrangeable or arranged in succession in a beam path (3) of the energy beam (4), characterized in that each determination unit (5, 6) builds or comprises at least one complementary pattern element (15, 18, 21, 23, 24, 27, 30), wherein at least two pattern elements (15, 18, 21, 23, 24, 27, 30) of the two determination units (5, 6) complement each other so as to form a superordinate pattern (32, 35).

2. Determination device according to claim 1, characterized in that the determination device (2) is adapted to generate calibration information relating to a calibration status of the energy beam (4), in particular relating to an alignment, in particular lateral alignment, and/or an angle of the energy beam (4) relative to a reference axis, preferably an optical axis.

3. Determination device according to claim 1, characterized in that the determination units (5, 6) comprise pattern elements (15, 18, 21, 23, 24, 27, 30) with at least one complementary part and at least one identical part.

4. Determination device according to claim 3, characterized in that the determination units (5, 6) are adapted to generate the superordinate pattern (32, 35) in an image plane, wherein the superordinate pattern (32, 35) comprises the images of the pattern elements (15, 18, 21, 23, 24, 27, 30) of the determination units (5, 6).

5. Determination device according to claim 1, characterized in that a, preferably annular, first determination unit (5) comprises a first pattern element (15) with a first inner diameter (17) and a first outer diameter (18), wherein the first outer diameter (18) of the first pattern element (15) of the first determination unit (5) corresponds to a first inner diameter (25) of a first pattern element (24) of a second determination unit (6).

6. Determination device according to claim 5, characterized in that a first outer diameter (26) of the first pattern element (24) of the second determination unit (6) is smaller than a second inner diameter (19) of a second pattern element (18) of the first determination unit (5).

7. Determination device according to claim 1, characterized in that each determination unit (5, 6) comprises at least one pattern element (23, 30), preferably four pattern elements (23, 30), extending in radial direction with respect to a reference axis, preferably an optical axis, wherein the pattern elements (23, 30) comprise at least one complementary part.

8. Determination device according to claim 1, characterized in by a determination means (12) that is adapted to determine an actual lateral position of the energy beam (4) and/or an actual angle of the energy beam (4), in particular adapted to compare the actual lateral position with a nominal position and/or to compare the actual angle with a nominal angle.

9. Determination device according to claim 1, characterized in that the determination device (2) comprises a beam splitter (8) and a screen (9), wherein the beam splitter (8) is adapted to guide an energy beam (4) that passed the two determination units (5, 6) to the screen (9), wherein the determination means (12) is adapted to receive radiation (10) emitted from the screen (9) passing through the beam splitter (8).

10. Determination device according to claim 9, characterized in that the determination means (12) is adapted to determine the center of an intensity distribution imaged to the screen (9).

11. Determination device according to claim 1, characterized in that the determination device (2) is adapted to determine deviations from a symmetry of at least one superordinate pattern (32, 35) and/or adapted to compare the determined superordinate pattern (32, 35) with a nominal superordinate pattern, in particular identify differences.

12. Determination device according to claim 1, characterized in that the determination device (2) is mountable in a position of a specific optical element in the beam path (3), in particular mountable to at least one receiving unit of the apparatus (1).

13. Determination device according to claim 1, characterized by a moving unit (14) adapted to move the determination device (2) between a determination position and a park position.

14. Apparatus (1) for additively manufacturing three-dimensional objects by means of successive layerwise selective irradiation and consolidation of layers of a build material which can be consolidated by means of an energy source, which apparatus (1) comprises an irradiation device adapted to generate at least one energy beam (4) and a determination device (2) that comprises two determination units (5, 6) arrangeable or arranged in succession in a beam path (3) of the energy beam (4), characterized in that each determination unit (5, 6) comprises at least one complementary pattern element (15, 18, 21, 23, 24, 27, 30), wherein at least two pattern elements (15, 18, 21, 23, 24, 27, 30) of the two determination units (5, 6) complement each other so as to form a superordinate pattern (32, 35).

15. Method for determining at least one parameter of an energy beam (4), in particular an energy beam (4) generated via an irradiation device of an apparatus (1) for additively manufacturing three-dimensional objects by means of successive layerwise selective irradiation and consolidation of layers of a build material which can be consolidated by means of an energy source, which apparatus (1) comprises an irradiation device adapted to generate at least one energy beam (4) and a determination device (2) that comprises two determination units (5, 6), characterized by arranging the two determination units (5, 6) in a beam path (3) of the energy beam (4) and generating a superordinate pattern (32, 35) in an image plane, wherein each determination unit (5, 6) comprises at least one complementary pattern element (15, 18, 21, 23, 24, 27, 30), wherein at least two pattern elements (15, 18, 21, 23, 24, 27, 30) of the two determination units (5, 6) complement each other so as to form a superordinate pattern (32, 35).