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COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM INCLUDING DISILYLAMINE COMPOUND AND METHOD FOR MANUFACTURING SILICON-CONTAINING THIN FILM USING THE SAME

  • US 20200131205A1
  • Filed: 04/19/2018
  • Published: 04/30/2020
  • Est. Priority Date: 04/20/2017
  • Status: Active Grant
First Claim
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1. A composition for depositing a silicon-containing thin film, comprising a disilylamine compound represented by the following Chemical Formula 1:

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