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ETCHING COMPOSITION ADDITIVE, METHOD FOR PREPARING THE SAME AND ETCHING COMPOSITION COMPRISING THE SAME

  • US 20200131438A1
  • Filed: 10/07/2019
  • Published: 04/30/2020
  • Est. Priority Date: 10/25/2018
  • Status: Active Grant
First Claim
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1. An etching composition additive comprising phosphoric acid and a silane compound represented by Formula 1 below:

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