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Direct-Deposition System Including Standoffs for Controlling Substrate-Mask Separation

  • US 20200131617A1
  • Filed: 10/24/2018
  • Published: 04/30/2020
  • Est. Priority Date: 10/24/2017
  • Status: Active Grant
First Claim
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1. A direct-deposition system for forming a patterned layer of a first material on a substrate by depositing the first material onto the substrate through a shadow mask, wherein the system comprises:

  • a first chuck for holding the substrate;

    a second chuck for holding the shadow mask; and

    a plurality of standoffs that are configured to establish a first separation between the shadow mask and the substrate.

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