TARGET FOR OBTAINING COLOURED GLAZING

• US 20200131623A1
• Filed: 04/27/2018
• Published: 04/30/2020
• Est. Priority Date: 04/28/2017
• Status: Abandoned Application

• Current Assignee: Saint-Gobain Coating Solutions
• Original Assignee: Saint-Gobain Coating Solutions
• Inventors: MAGDENKO-SAVOUREY, Liubov, BILLIERES, Dominique, MATEUS, Crisalla, MARLIN, Samuel
• Application Number:
  US16/607,810
• Publication Number:
  US 20200131623A1
• Time in Patent Office: Days
• CPC Class Codes: B22F 1/054 Nanosized particles
• CPC Class Codes: B22F 2207/17 density or porosity gradients
• CPC Class Codes: B22F 2999/00 Aspects linked to processes or compositions used in powder metallurgy
• CPC Class Codes: B22F 5/006 of flat products, e.g. sheets B22F3/1103 takes precedence; by using pressure rollers only see B22F3/18
• CPC Class Codes: B22F 5/106 Tube or ring forms
• CPC Class Codes: B22F 9/14 using electric discharge
• CPC Class Codes: C03C 17/002 for flat glass, e.g. float glass
• CPC Class Codes: C03C 17/2456 Coating containing TiO2
• CPC Class Codes: C03C 17/3423 at least one of the coatings comprising a suboxide
• CPC Class Codes: C03C 17/3435 comprising a nitride, oxynitride, boronitride or carbonitride
• CPC Class Codes: C03C 17/3644 the metal being silver
• CPC Class Codes: C03C 17/366 Low-emissivity or solar control coatings
• CPC Class Codes: C03C 17/3681 the multilayer coating being used in glazing, e.g. windows or windscreens
• CPC Class Codes: C03C 2217/212 TiO2
• CPC Class Codes: C03C 2217/24 Doped oxides
• CPC Class Codes: C03C 2218/154 by sputtering
• CPC Class Codes: C04B 38/00 Porous mortars, concrete, artificial stone or ceramic ware; Preparation thereof treating slag with gases or gas generating material C04B5/06 ; expanded graphite C04B35/536
• CPC Class Codes: C22C 1/1015 by preparing or treating a non-metallic additive preform
• CPC Class Codes: C22C 1/1021 the preform being ceramic
• CPC Class Codes: C22C 1/1084 by mechanical alloying (blending, milling)
• CPC Class Codes: C22C 26/00 : Alloys containing diamond or cubic or wurtzitic boron nitride, fullerenes or carbon nanotubes
• CPC Class Codes: C22C 29/12 : based on oxides
• CPC Class Codes: C22C 32/0021 : Matrix based on noble metals, Cu or alloys thereof
• CPC Class Codes: C22C 32/0026 : Matrix based on Ni, Co, Cr or alloys thereof
• CPC Class Codes: C22C 5/00 : Alloys based on noble metals
• CPC Class Codes: C23C 14/0015 : characterized by the colour of the layer
• CPC Class Codes: C23C 14/06 : characterised by the coating material C23C14/0021 , C23C14/04 take precedence
• CPC Class Codes: C23C 14/0688 : Cermets, e.g. mixtures of metal and one or more of carbides, nitrides, oxides or borides
• CPC Class Codes: C23C 14/185 : by cathodic sputtering
• CPC Class Codes: C23C 14/3414 : Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
• CPC Class Codes: C23C 28/321 : with at least one metal alloy layer
• CPC Class Codes: H01J 37/3417 : Arrangements
• CPC Class Codes: H01J 37/3429 : Plural materials

Abstract

A cathode sputtering target is formed, on the one hand, from an oxide of at least one element chosen from the group of titanium, silicon and zirconium and, on the other hand, of particles of a metal included in the group formed by silver, gold, platinum, copper and nickel or particles of an alloy formed from at least two of these metals, the atomic ratio M/Me in the target being less than 1.5, M representing all of the atoms of the elements of the group of titanium, silicon and zirconium present in the layer and Me representing all of the atoms of the metals of the group formed by silver, gold, platinum, copper and nickel present in the layer.

Claims

1. A cathode sputtering target formed from an oxide of at least one element chosen from a group of titanium, silicon and zirconium and of particles of a metal included in a group formed by silver, gold, platinum, copper and nickel or particles of an alloy formed from at least two of the metals, the M/Me atomic ratio in said target being less than 1.5, M representing all of the atoms of the elements of the group of titanium, silicon and zirconium and Me representing all of the atoms of the metals of the group formed by silver, gold, platinum, copper and nickel.

2. The target as claimed in claim 1, in which the M/Me atomic ratio is less than 1.2.

3. The target as claimed in claim 1, in which the M/Me atomic ratio is less than 1.0.

4. The target as claimed in claim 1, in which the M/Me atomic ratio is less than 0.8.

5. The target as claimed in claim 1, in which M represents a single element.

6. The target as claimed in claim 1, in which said oxide is a titanium oxide of formula TiO_x with x≤

2.

7. The target as claimed in claim 6, in which said oxide is a titanium oxide of formula TiO_x with x<

2.

8. The target as claimed in claim 1, in which the metal is silver, gold, platinum, copper or nickel.

9. The target as claimed in claim 1, in which the metal is silver, gold or platinum.

10. The target as claimed in claim 1, in which the metal is silver.

11. The target as claimed in claim 1, wherein the target is made from a mixture of titanium oxide and of silver particles, the Ti/Ag atomic ratio in said target being less than 1.5.

12. The target as claimed in claim 1, in which the electrical resistivity, as measured according to standard ASTM F76), is less than 5 Ω

·

cm.

13. The target as claimed in claim 1, in which the porosity is less than 10%.

14. The target as claimed in claim 1, in which the distribution of Me relative to M is such that the difference D between the maximum content of Me phase measured in said target and the minimum content of Me phase measured in said target, on a plurality of analysis zones of the same area 70×

70 μ

m², is less than 50% of the mean content of Me phase measured on said target.

15. The target as claimed in claim 1, in which the overall standard deviation calculated on the total number of measurements is less than 25% of the mean content of Me phase measured on said target.

16. A process for manufacturing a target as claimed in claim 1, comprising:

thermal sputtering onto a support a mixture of the oxide of at least one element chosen from the group of titanium, silicon and zirconium and of particles of a metal included in the group formed by silver, gold, platinum, copper and nickel or particles of an alloy formed from at least two of these metals.

17. A process for manufacturing a target as claimed in claim 1, comprising:

mixing the oxide of at least one element chosen from the group of titanium, silicon and zirconium in a molten bath of the metal included in the group formed by silver, gold, platinum, copper and nickel or an alloy formed from at least two of these metals; and

forming said target.

18. The process for manufacturing a target as claimed in the claim 17, in which the mixing step comprises sputtering or gravity deposition of the particles of the oxide of at least one element chosen from the group of titanium, silicon and zirconium in the bath of molten metal.

19. The target as claimed in claim 7, in which said oxide is a titanium oxide of formula TiO_x in which 1.70<

x<

2.0.

20. The target as claimed in claim 11, wherein the Ti/Ag atomic ratio in said target being less than 0.6.