STAGE DEVICE AND PROCESSING APPARATUS
First Claim
1. A stage device comprising:
- a stage configured to hold a target substrate in a vacuum chamber;
a chiller having a cold head maintained at an extremely low temperature;
a cold heat transfer body fixed in contact with the cold head and disposed below a bottom surface of the stage with a gap between the stage and the cold heat transfer body;
a heat insulating structure unit having a vacuum insulated structure and configured to surround at least the cold head and a connection portion between the cold head and the cold heat transfer body;
cooling fluid supplied to the gap to transfer cold heat of the cold heat transfer body to the stage; and
a stage support rotated by a driving mechanism and configured to rotatably support the stage.
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Accused Products
Abstract
A stage device includes a stage configured to hold a target substrate in a vacuum chamber, a chiller having a cold head maintained at an extremely low temperature and a cold heat transfer body fixed in contact with the cold head and disposed below a bottom surface of the stage with a gap between the stage and the cold heat transfer body. The stage device further includes a heat insulating structure unit having a vacuum insulated structure and configured to surround at least the cold head and a connection portion between the cold head and the cold heat transfer body, cooling fluid supplied to the gap to transfer cold heat of the cold heat transfer body to the stage, and a stage support rotated by a driving mechanism and configured to rotatably support the stage.
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Citations
20 Claims
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1. A stage device comprising:
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a stage configured to hold a target substrate in a vacuum chamber; a chiller having a cold head maintained at an extremely low temperature; a cold heat transfer body fixed in contact with the cold head and disposed below a bottom surface of the stage with a gap between the stage and the cold heat transfer body; a heat insulating structure unit having a vacuum insulated structure and configured to surround at least the cold head and a connection portion between the cold head and the cold heat transfer body; cooling fluid supplied to the gap to transfer cold heat of the cold heat transfer body to the stage; and a stage support rotated by a driving mechanism and configured to rotatably support the stage. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. A processing apparatus comprising:
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a vacuum chamber; a stage device configured to rotatably support a target substrate in the vacuum chamber, the stage devic comprising; a stage configured to hold the target substrate in a vacuum chamber, a chiller having a cold head maintained at an extremely low temperature, a cold heat transfer body fixed in contact with the cold head and disposed below a bottom surface of the stage with a gap between the stage and the cold heat transfer body, a heat insulating structure unit having a vacuum insulated structure and configured to surround at least the cold head and a connection portion between the cold head and the cold heat transfer body, cooling fluid supplied to the gap to transfer cold heat of the cold heat transfer body to the stage, and a stage support rotated by a driving mechanism and configured to rotatably support the stage; and a processing mechanism configured to process the target substrate in the vacuum chamber. - View Dependent Claims (19, 20)
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Specification