SUBSTRATE PROCESSING APPARATUS
First Claim
1. A substrate processing apparatus comprising:
- a transfer chamber where a substrate is transferred into a substrate retainer;
an upper gas supply mechanism configured to supply a gas into an upper region of the transfer chamber through a first gas supply port; and
a lower gas supply mechanism disposed under the upper gas supply mechanism and configured to supply the gas into a lower region of the transfer chamber through a second gas supply port,wherein the upper gas supply mechanism comprises;
a first buffer chamber disposed at a back surface of the first gas supply port;
an upper duct disposed adjacent to the first buffer chamber; and
a first supply unit disposed at a lower end of the upper duct, andthe lower gas supply mechanism comprises;
a second buffer chamber disposed at a back surface of the second gas supply port;
a lower duct disposed adjacent to the second buffer chamber; and
a second supply unit disposed at a lower end of the lower duct.
2 Assignments
0 Petitions
Accused Products
Abstract
A substrate processing apparatus including a transfer chamber; upper gas supply mechanism that supplies a gas into an upper region of the transfer chamber through a first gas supply port; and lower gas supply mechanism that supplies the gas into a lower region of the transfer chamber through a second gas supply port. The upper gas supply mechanism includes a first buffer chamber disposed at a back surface of the first gas supply port; a pair of upper ducts disposed at both sides of the first buffer chamber; and a first ventilation unit disposed at lower ends of the pair of upper ducts. The lower gas supply mechanism includes a second buffer chamber disposed at a back surface of the second gas supply port; a lower duct disposed at lower surface of the second buffer chamber; and a second ventilation unit disposed at a lower end of the lower duct.
1 Citation
14 Claims
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1. A substrate processing apparatus comprising:
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a transfer chamber where a substrate is transferred into a substrate retainer; an upper gas supply mechanism configured to supply a gas into an upper region of the transfer chamber through a first gas supply port; and a lower gas supply mechanism disposed under the upper gas supply mechanism and configured to supply the gas into a lower region of the transfer chamber through a second gas supply port, wherein the upper gas supply mechanism comprises; a first buffer chamber disposed at a back surface of the first gas supply port; an upper duct disposed adjacent to the first buffer chamber; and a first supply unit disposed at a lower end of the upper duct, and the lower gas supply mechanism comprises; a second buffer chamber disposed at a back surface of the second gas supply port; a lower duct disposed adjacent to the second buffer chamber; and a second supply unit disposed at a lower end of the lower duct. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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Specification