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FEEDING STRUCTURE, UPPER ELECTRODE ASSEMBLY, AND PHYSICAL VAPOR DEPOSITION CHAMBER AND DEVICE

  • US 20200135438A1
  • Filed: 12/23/2019
  • Published: 04/30/2020
  • Est. Priority Date: 06/29/2017
  • Status: Active Grant
First Claim
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1. A feeding structure for a physical vapor deposition device, comprising:

  • a first introduction member configured to receive power;

    a second introduction member coupled to the first introduction member; and

    a plurality of distribution members evenly distributed around an axis of the first introduction member,wherein one end of each distribution member is coupled to the second introduction member and the other end of each distribution member is configured to provide power to a target.

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