FEEDING STRUCTURE, UPPER ELECTRODE ASSEMBLY, AND PHYSICAL VAPOR DEPOSITION CHAMBER AND DEVICE
First Claim
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1. A feeding structure for a physical vapor deposition device, comprising:
- a first introduction member configured to receive power;
a second introduction member coupled to the first introduction member; and
a plurality of distribution members evenly distributed around an axis of the first introduction member,wherein one end of each distribution member is coupled to the second introduction member and the other end of each distribution member is configured to provide power to a target.
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Abstract
The present disclosure provides a feeding structure, an upper electrode assembly, and a physical vapor deposition chamber and device. In the present disclosure a RF power is fed through the center of a first introduction member of the feeding structure and is evenly distributed onto a target by a plurality of distribution members.
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Citations
20 Claims
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1. A feeding structure for a physical vapor deposition device, comprising:
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a first introduction member configured to receive power; a second introduction member coupled to the first introduction member; and a plurality of distribution members evenly distributed around an axis of the first introduction member, wherein one end of each distribution member is coupled to the second introduction member and the other end of each distribution member is configured to provide power to a target. - View Dependent Claims (2, 3, 4, 5)
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6. An upper electrode assembly, comprising:
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a feeding structure comprising a first introduction member configured to receive power;
a second introduction member coupled to the first introduction member;
a plurality of distribution members evenly distributed around an axis of the first introduction member; anda radio frequency (RF) power supply or a direct current (DC) power supply coupled to the first introduction member. - View Dependent Claims (7, 8, 9, 10, 11, 12, 13, 14)
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15. A physical vapor deposition chamber, comprising:
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a chamber body; and an upper electrode assembly disposed on top of the chamber body, the upper electrode assembly comprising a feeding structure comprising a first introduction member configured to receive power;
a second introduction member coupled to the first introduction member;
a plurality of distribution members evenly distributed around an axis of the first introduction member; and
a radio frequency (RF) power supply or a direct current (DC) power supply coupled to the first introduction member.
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16. A physical vapor deposition device, comprising:
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a physical vapor disposition chamber comprising a chamber body; and an upper electrode assembly disposed on top of the chamber body, the upper electrode assembly comprising a feeding structure including a first introduction member configured to receive power;
a second introduction member coupled to the first introduction member;
a plurality of distribution members evenly distributed around an axis of the first introduction member; and
a radio frequency (RF) power supply or a direct current (DC) power supply coupled to the first introduction member. - View Dependent Claims (17, 18, 19, 20)
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Specification