LINERLESS CONTINUOUS AMORPHOUS METAL FILMS

• US 20200135456A1
• Filed: 10/08/2019
• Published: 04/30/2020
• Est. Priority Date: 10/29/2018
• Status: Active Grant

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: ROY, Susmit Singha, WU, Yong, GANDIKOTA, Srinivas
• Granted Patent: US 10,930,493 B2
• Time in Patent Office: Days
• CPC Class Codes: H01L 21/02208 the precursor containing a compound comprising Si
• CPC Class Codes: H01L 21/02238 silicon in uncombined form, i.e. pure silicon
• CPC Class Codes: H01L 21/02532 Silicon, silicon germanium, germanium
• CPC Class Codes: H01L 21/02592 amorphous
• CPC Class Codes: H01L 21/0262 Reduction or decomposition of gaseous compounds, e.g. CVD
• CPC Class Codes: H01L 21/28079 the final conductor layer next to the insulator being a single metal, e.g. Ta, W, Mo, Al
• CPC Class Codes: H01L 21/32051 Deposition of metallic or metal-silicide layers
• CPC Class Codes: H01L 21/321 After treatment
• CPC Class Codes: H01L 21/324 Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering H01L21/20 - H01L21/288 and H01L21/302 - H01L21/322 take precedence
• CPC Class Codes: H01L 21/76823 transforming an insulating layer into a conductive layer
• CPC Class Codes: H01L 21/76843 formed in openings in a dielectric
• CPC Class Codes: H01L 21/76868 Forming or treating discontinuous thin films, e.g. repair, enhancement or reinforcement of discontinuous thin films
• CPC Class Codes: H01L 21/76876 for deposition from the gas phase, e.g. CVD

Abstract

Embodiments described herein generally relate to methods of depositing thin films and, more particularly, to depositing metal thin films. The methods herein provide a nucleation free conversion (NFC) approach which involves forming an amorphous silicon layer over the dielectric layer, and performing an NFC process which acts to convert the amorphous silicon layer into a thin metal film. In some embodiments, the NFC process is performed multiple times until the resulting thin metal film is continuous. A bulk metal is formed over the thin metal film.

Claims

1. A method of filling a feature formed on a surface of a substrate, comprising:

forming a continuous metal layer on the feature formed on the surface of the substrate, wherein a process of forming the continuous metal layer comprises;

(a) forming an amorphous silicon layer on exposed surfaces of the feature;

(b) converting the formed amorphous silicon layer to a metal thin film, wherein the process of converting the amorphous silicon layer comprises exposing the amorphous silicon layer to a metal containing precursor until substantially all of the silicon atoms in the amorphous silicon layer are replaced by one or more metal atoms found in the metal containing precursor; and

(c) repeating (a) and (b) at least twice, and until a continuous thin film containing the metal atoms is formed on the surface of the feature; and

forming a bulk metal layer over the formed continuous thin film.

2. The method of claim 1, wherein the process is performed at a pressure between about 5 Torr and about 20 Torr.

3. The method of claim 1, wherein the substrate temperature during the process is maintained at a temperature between about 250 degrees Celsius and about 500 degrees Celsius.

4. The method of claim 1, wherein the process occurs at an RF power range between about 50 W and about 500 W.

5. The method of claim 1, wherein the metal thin film is made of tungsten.

6. The method of claim 1, wherein the substrate is made of materials consisting essentially of silicon nitride, silicon oxide, or aluminum oxide.

7. The method of claim 1, wherein the bulk metal has a resistivity of less than or equal to about 20 μ

Ω

-cm.

8. A method for forming a thin film on a surface of a substrate, comprising:

forming a continuous metal layer on a feature formed on the surface of the substrate, wherein a process of forming the continuous metal layer comprises;

(a) forming an amorphous silicon layer on exposed surfaces of the feature;

(b) converting the formed amorphous silicon layer to a metal thin film, wherein the process of converting the amorphous silicon layer comprises exposing the amorphous silicon layer to a metal containing precursor until substantially all of the silicon atoms in the amorphous silicon layer are replaced by one or more metal atoms found in the metal containing precursor; and

(c) repeating (a) and (b) at least twice, and until a continuous thin film containing the metal atoms is formed on the surface of the feature and the thin film is between about 10 angstroms and about 100 angstroms; and

filling the feature formed on the surface of the substrate by forming a bulk metal layer over the formed continuous thin film.

9. The method of claim 8, wherein the process is performed at a pressure between about 5 Torr and about 20 Torr.

10. The method of claim 8, wherein the substrate temperature during the process is maintained at a temperature between about 250 degrees Celsius and about 500 degrees Celsius.

11. The method of claim 8, wherein the process occurs at an RF power range between about 50 W and about 500 W.

12. The method of claim 8, wherein the metal thin film is made of tungsten.

13. The method of claim 8, wherein the substrate is made of materials consisting essentially of silicon nitride, silicon oxide, or aluminum oxide.

14. The method of claim 8, wherein the bulk metal has a resistivity of less than or equal to about 20 μ

Ω

-cm.

15. A method for forming a thin film, comprising:

forming a continuous metal layer on a feature formed on a surface of a substrate, wherein a process of forming the continuous metal layer comprises;

(a) forming an amorphous silicon layer on exposed surfaces of the feature, wherein the amorphous silicon layer is between about 10 angstroms and about 40 angstroms;

(b) converting the formed amorphous silicon layer to a metal thin film, wherein the process of converting the amorphous silicon layer comprises exposing the amorphous silicon layer to a metal containing precursor until substantially all of the silicon atoms in the amorphous silicon layer are replaced by one or more metal atoms found in the metal containing precursor; and

(c) repeating (a) and (b) at least twice, and until a continuous thin film containing the metal atoms is formed on the surface of the feature and the thin film has a thickness of between about 10 angstroms and about 100 angstroms; and

filling the feature formed on the surface of the substrate by forming a bulk metal layer over the formed continuous thin film.

16. The method of claim 15, wherein the process is performed at a pressure between about 5 Torr and about 20 Torr.

17. The method of claim 15, wherein the substrate temperature during the process is maintained at a temperature between about 250 degrees Celsius and about 500 degrees Celsius.

18. The method of claim 15, wherein the process occurs at an RF power range between about 50 W and about 500 W.

19. The method of claim 15, wherein the metal thin film is made of tungsten.

20. The method of claim 15, wherein the bulk metal has a resistivity of less than or equal to about 20 μ

Ω

-cm.