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ION IMPLANTATION APPARATUS AND METHOD

  • US 20200135470A1
  • Filed: 04/11/2019
  • Published: 04/30/2020
  • Est. Priority Date: 10/29/2018
  • Status: Active Grant
First Claim
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1. A system for an ion implantation (IMP) process, comprising:

  • an ion implanter configured to scan an ion beam over a target for a range of angles;

    a tilting mechanism configured to support and tilt the target;

    an ion-collecting device configured to collect a distribution and a number of ejected ions from the ion beam scan over the target; and

    a control unit configured to adjust a tilt angle based on a correction angle determined based on the distribution and number of ejected ions.

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