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SEMICONDUCTOR STRUCTURE ETCHING SOLUTION AND METHOD FOR FABRICATING A SEMICONDUCTOR STRUCTURE USING THE SAME ETCHING SOLUTION

  • US 20200135479A1
  • Filed: 04/01/2019
  • Published: 04/30/2020
  • Est. Priority Date: 10/25/2018
  • Status: Active Grant
First Claim
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1. A semiconductor structure etching solution, comprising:

  • an etchant;

    an ionic strength enhancer having an ionic strength greater than 10

    3
    M in the semiconductor structure etching solution; and

    a solvent having a dielectric constant lower than a dielectric constant of water.

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