SILICON-CONTROLLED RECTIFIERS WITH WELLS LATERALLY ISOLATED BY TRENCH ISOLATION REGIONS
First Claim
1. A device structure for a silicon-controlled rectifier, the device structure comprising:
- a substrate having a top surface;
a first well of a first conductivity type arranged in the substrate;
a second well of a second conductivity type arranged in the substrate between the first well and the top surface of the substrate, the second well adjoined with the first well along a first interface;
a third well of the second conductivity type arranged in the substrate between the first well and the top surface of the substrate, the third well adjoined with the first well along a second interface;
a first deep trench isolation region laterally arranged in the substrate between the third well of the second conductivity type and the second well of the second conductivity type, the first deep trench isolation region extending from the top surface of the substrate past the first interface and the second interface and into the first well; and
a first doped region of the first conductivity type arranged in the substrate between the second well and the top surface of the substrate,wherein the first well extends continuously beneath the first deep trench isolation region.
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Accused Products
Abstract
Silicon-controlled rectifiers and methods for forming a silicon-controlled rectifier. A first well of a first conductivity type is arranged in a substrate, and second and third wells of a second conductivity type are arranged in the substrate between the first well and the top surface of the substrate. A deep trench isolation region is laterally arranged between the first well of the second conductivity type and the second well of the second conductivity type. The second well is adjoined with the first well along a first interface, the third well is adjoined with the first well along a second interface, and the deep trench isolation region extends the top surface of the substrate past the first interface and the second interface and into the first well. A doped region of the first conductivity type is arranged in the substrate between the second well and the top surface of the substrate.
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Citations
20 Claims
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1. A device structure for a silicon-controlled rectifier, the device structure comprising:
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a substrate having a top surface; a first well of a first conductivity type arranged in the substrate; a second well of a second conductivity type arranged in the substrate between the first well and the top surface of the substrate, the second well adjoined with the first well along a first interface; a third well of the second conductivity type arranged in the substrate between the first well and the top surface of the substrate, the third well adjoined with the first well along a second interface; a first deep trench isolation region laterally arranged in the substrate between the third well of the second conductivity type and the second well of the second conductivity type, the first deep trench isolation region extending from the top surface of the substrate past the first interface and the second interface and into the first well; and a first doped region of the first conductivity type arranged in the substrate between the second well and the top surface of the substrate, wherein the first well extends continuously beneath the first deep trench isolation region. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A method for forming a device structure for a silicon-controlled rectifier, the method comprising:
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forming a first well of a first conductivity type arranged in a substrate; forming a second well of a second conductivity type and a third well of the second conductivity type each arranged in the substrate between the first well and a top surface of the substrate; forming a first deep trench isolation region laterally arranged between the third well of the second conductivity type and the second well of the second conductivity type; and forming a first doped region of the first conductivity type arranged in the substrate between the second well and the top surface of the substrate, wherein the second well is adjoined with the first well along a first interface, the third well is adjoined with the first well along a second interface, the first deep trench isolation region extends from the top surface of the substrate past the first interface and the second interface and into the first well, and the first well extends continuously beneath the first deep trench isolation region. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification