APPARATUS AND METHOD FOR GENERATING AN ELECTROMAGNETIC RADIATION
First Claim
1. An electromagnetic radiation generation apparatus, comprising:
- a collector having a reflection surface configured to reflect an electromagnetic radiation, wherein the collector includes a bottom portion, a perimeter portion, and a middle portion between the bottom portion and the perimeter portion, wherein the middle portion of the collector comprises a plurality of openings;
a gas supplier configured to provide a buffer gas; and
a gas pipeline in communication with the gas supplier and the collector, and configured to purge the buffer gas through the openings of the middle portion to form a gas protection layer near the reflection surface of the collector.
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Accused Products
Abstract
An electromagnetic radiation generation apparatus includes a collector, a gas supplier and a gas pipeline. The collector has a reflection surface configured to reflect an electromagnetic radiation. The collector includes a bottom portion, a perimeter portion, and a middle portion between the bottom portion and the perimeter portion. The middle portion of the collector includes a plurality of openings. The gas supplier is configured to provide a buffer gas. The gas pipeline is in communication with the gas supplier and the collector, and configured to purge the buffer gas through the openings of the middle portion to form a gas protection layer near the reflection surface of the collector. The openings of the middle portion include a plurality of holes arranged in an array including a plurality of rows of holes, or a plurality of concentric gaps.
13 Citations
20 Claims
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1. An electromagnetic radiation generation apparatus, comprising:
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a collector having a reflection surface configured to reflect an electromagnetic radiation, wherein the collector includes a bottom portion, a perimeter portion, and a middle portion between the bottom portion and the perimeter portion, wherein the middle portion of the collector comprises a plurality of openings; a gas supplier configured to provide a buffer gas; and a gas pipeline in communication with the gas supplier and the collector, and configured to purge the buffer gas through the openings of the middle portion to form a gas protection layer near the reflection surface of the collector. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. An electromagnetic radiation generation apparatus, comprising:
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a chamber; a target material supplier connected to the chamber and configured to supply a target material to an excitation region; a light source configured to emit a light beam on the target material in the excitation region to generate plasma and an electromagnetic radiation; a collector disposed under the chamber, the collector having a reflection surface configured to reflect the electromagnetic radiation, wherein the collector comprises a plurality of holes arranged in an array including a plurality of rows of holes; a gas supplier configured to provide a buffer gas; and a gas pipeline in communication with the gas supplier and the holes of the collector, and configured to purge the buffer gas to the excitation region through the holes of the collector to reduce debris of the target material and plasma by-products from being deposited on the reflection surface of the collector. - View Dependent Claims (12, 13, 14)
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15. An electromagnetic radiation generation apparatus, comprising:
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a chamber; a target material supplier connected to the chamber and configured to supply a target material to an excitation region; a light source configured to emit a light beam on the target material in the excitation region to generate plasma and an electromagnetic radiation; a collector disposed under the chamber, the collector including a plurality of concentric ring structures and a reflection surface configured to collect and reflect the electromagnetic radiation, wherein two adjacent concentric ring structures are separated by a concentric gap; a gas supplier configured to provide a buffer gas; and a gas pipeline in communication with the gas supplier and the concentric gaps of the collector, and configured to purge the buffer gas to the excitation region through the concentric gaps of the collector to reduce debris of the target material and plasma by-products from being deposited on the reflection surface of the collector. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification