RING ISOLATED THROUGH-SUBSTRATE VIAS FOR HIGH RESISTIVITY SUBSTRATES
First Claim
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1. A semiconductor chip comprising:
- a high resistivity semiconductor substrate;
an electronic device formed over a front side of the substrate;
a through-substrate via laterally spaced from the electronic device;
a first deep trench isolation structure extending at least partially through the substrate and laterally spaced from and surrounding the electronic device; and
a second deep trench isolation structure extending at least partially through the substrate and laterally spaced from and surrounding the through-substrate via,wherein a portion of the first deep trench isolation structure is contiguous with a portion of the second deep trench isolation structure.
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Abstract
Through-substrate vias (TSVs) extend through a high resistivity semiconductor substrate laterally spaced and isolated from an active device formed over the substrate by deep trench isolation (DTI) structures. The deep trench isolation structures may extend partially or entirely through the substrate, and may include an air gap. The deep trench isolation structures entirely surround the active device and the TSVs.
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Citations
29 Claims
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1. A semiconductor chip comprising:
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a high resistivity semiconductor substrate; an electronic device formed over a front side of the substrate; a through-substrate via laterally spaced from the electronic device; a first deep trench isolation structure extending at least partially through the substrate and laterally spaced from and surrounding the electronic device; and a second deep trench isolation structure extending at least partially through the substrate and laterally spaced from and surrounding the through-substrate via, wherein a portion of the first deep trench isolation structure is contiguous with a portion of the second deep trench isolation structure. - View Dependent Claims (2, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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3. (canceled)
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13-20. -20. (canceled)
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21. A semiconductor chip comprising:
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a high resistivity semiconductor substrate; an electronic device formed over a front side of the substrate; a metallization layer disposed over a back side of the substrate; a through-substrate via laterally spaced from the electronic device; a first deep trench isolation structure extending at least partially through the substrate and laterally spaced from and surrounding the electronic device; a second deep trench isolation structure extending at least partially through the substrate and laterally spaced from and surrounding the through-substrate via; and a first air gap independently within the first deep trench isolation structure and a second air gap independently within the second deep trench isolation structure, wherein a portion of the first deep trench isolation structure is contiguous with a portion of the second deep trench isolation structure. - View Dependent Claims (22, 24, 25, 26, 27, 28)
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23. (canceled)
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29. A semiconductor chip comprising:
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a high resistivity semiconductor substrate; an electronic device formed over a front side of the substrate; a through-substrate via laterally spaced from the electronic device; a first deep trench isolation structure extending at least partially through the substrate and laterally spaced from and surrounding the electronic device; and a second deep trench isolation structure extending at least partially through the substrate and laterally spaced from and surrounding the through-substrate via, wherein the first deep trench isolation structure and the second deep trench isolation structure independently extend vertically entirely through the substrate.
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Specification