Contra-rotating plasma system

• US 3,132,996 A
• Filed: 12/10/1962
• Issued: 05/12/1964
• Est. Priority Date: 12/10/1962
• Status: Expired due to Term

• Current Assignee: Klaus Halbach, William R. Baker
• Original Assignee: Klaus Halbach, William R. Baker
• Inventors: Baker, William R., KLAUS HALBACH
• Application Number:
  US04/243,683
• Time in Patent Office: 519 Days
• US Class Current: 376/130
• CPC Class Codes: H05H 1/16 using externally-applied electric and magnetic fields
• CPC Class Codes: Y02E 30/10 Nuclear fusion reactors

Claims

1. IN A MAGNETOHYDRODYNAMIC APPARATUS, THE COMBINATION COMPRISING:

(A) AN ANNULAR OUTER ELECTRODE, (B) MEANS PROVIDING A MAGNETIC FIELD WITH SAID OUTER ELECTRODE WHICH FIELD IS SYMMETRIC ABOUT AN AXIS EXTENDING LONGITUDINALLY THROUGH SAID OUTER ELECTRODE AND WHICH FORMS A PLASMA TRAPPING REGION THEREIN, (C) A CENTRAL ELECTRODE DISPOSED WITHIN SAID OUTER ELECTRODE SUBSTANTIALLY AT SAID AXIS AND PROJECTING INTO SAID PLASMA TRAPPING REGION, (D) AN ANNULAR FIELD ELECTRODE DISPOSED WITHIN SAID OUTER ELECTRODE AND ENCIRCLING SAID AXIS IN SPACED APART RELATION TO SAID CENTRAL ELECTRODE AND SAID OUTER ELECTRODE, (E) A HIGH VOLTAGE SOURCE APPLYING A NEGATIVE POTENTIAL TO SAID FIELD ELECTRODE RELATIVE TO THAT OF SAID OUTER ELECTRODE AND SAID CENTRAL ELECTRODE, (F) MEANS FOR ADMITTING GAS TO SAID PLASMA TRAPPING REGION AND, (G) MEANS PROVIDING FOR A SUBSTANTIAL DEGREE OF VACUUM WITHIN SAID PLASMA TRAPPING REGION.