Electro-optical high speed adjustable focusing zone plate

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1. AN ADJUSTABLE FOCUSING SYSTEM COMPRISING:

A SOURCE OF COLLIMATED, HIGH FREQUENCY ELECTROMAGNETIC RADIATION, AN ELECTRO-OPTIC SUBSTANCE WHICH WILL EXHIBIT A BIREFRINGENT ELECTRO-OPTIC EFFECT AT POINTS DISPLACED FROM THE CENTER OF AN ELECTRIC FIELD A DISTANCE PROPORTIONAL TO THE MAGNITUDE OF THE ELECTRIC FIELD, ELECTRIC POTENTIAL MEANS TO IMPRESS AN ELECTRIC FIELD IN A PATTERN ACROSS SAID ELECTRO-OPTIC SUBSTANCE AT SUCH LOCATIONS AND OF SUCH MAGNITUDE THAT BIREFRINGENT EFFECTS OCCUR WHICH DEFINE A FIRST FRESNEL ZONE PLATE TO SAID RADIATION, AND MEANS TO VARY SAID ELECTRIC FIELD PATTERN SO THAT THE BIREFRINGENT EFFECTS DEFINE A SECOND FRESNEL ZONE PLATE TO SAID RADIATION WHICH CAUSES FOCUSING AT A POINT DIFFERENT FROM SAID FIRST FRESNEL ZONE PLATE.

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1. AN ADJUSTABLE FOCUSING SYSTEM COMPRISING:
- A SOURCE OF COLLIMATED, HIGH FREQUENCY ELECTROMAGNETIC RADIATION, AN ELECTRO-OPTIC SUBSTANCE WHICH WILL EXHIBIT A BIREFRINGENT ELECTRO-OPTIC EFFECT AT POINTS DISPLACED FROM THE CENTER OF AN ELECTRIC FIELD A DISTANCE PROPORTIONAL TO THE MAGNITUDE OF THE ELECTRIC FIELD, ELECTRIC POTENTIAL MEANS TO IMPRESS AN ELECTRIC FIELD IN A PATTERN ACROSS SAID ELECTRO-OPTIC SUBSTANCE AT SUCH LOCATIONS AND OF SUCH MAGNITUDE THAT BIREFRINGENT EFFECTS OCCUR WHICH DEFINE A FIRST FRESNEL ZONE PLATE TO SAID RADIATION, AND MEANS TO VARY SAID ELECTRIC FIELD PATTERN SO THAT THE BIREFRINGENT EFFECTS DEFINE A SECOND FRESNEL ZONE PLATE TO SAID RADIATION WHICH CAUSES FOCUSING AT A POINT DIFFERENT FROM SAID FIRST FRESNEL ZONE PLATE.

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