PHOTOMETER FOR OBSERVATION INSTRUMENTS MAINLY FOR MICROSCOPES
First Claim
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1. A photometer for observation instruments, mainly microscopes, enabling simultaneous observation of an object being investigated and of a measuring diaphragm limiting the area being photometrically analyzed, comprising:
- a main optical path for observation of aN object, polarizing beam splitting means dividing said main path into an observation beam path and a measurement beam path, one of which is at an angle to the main path, apertured measuring diaphragm means in said measuring beam path, eyepiece means in said observation beam path for permitting visual observation of the images of said diaphragm means and said object;
said polarizing beam splitting means having at least three ports, linear polarizing means positioned in said beam splitter means common to both beam paths for linearly polarizing unpolarized images incident upon it of said object and said diaphragm, and for diverting linearly polarized images of said diaphragm and said object upon it to the other of said beam paths from which it is incident;
a specular reflecting means in each of said beam paths, said reflecting means in said measuring beam path reflecting the images of said object and said diaphragm to said linear polarizing means for reflection thereby to said eyepiece;
two light retarders, one placed in each beam path between said linear polarizing means and said reflecting means for changing the polarization of said images passed to it from said linear polarizing means and transmitted first by it to circular polarized light, and transmitted again, after reflection from said reflecting means, by it to said linear polarizing means as linear polarized light turned from the images'"'"''"'"' initial polarization direction, according to the orientation in the above said linear polarizing means;
whereby images of said object and said diaphragm linearly polarized in mutually different directions are passed to said eyepiece and light from said diaphragm means is precluded from passing along the main optical path to said object.
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Abstract
Photometer enabling simultaneous observation of an object being investigated and of a measuring diaphragm, provided with visual and measuring systems, wherein one or two polarizing been splitters divide the main light beam entering into the instrument into two beams which are linearly polarized. The image of the measuring diaphragm is projected on the background of the image of the object being investigated by means of special plates which turn the direction of the light vibrations and change the kind of light polarization from linear to circular. The images of the measuring diaphragm and of the investigated object are formed by two beams which are linearly polarized, whereby the directions of light vibrations are mutually perpendicular. The visual system of the photometer has a polarizing filter, enabling the controlling of the ratio of luminance of the measuring diaphragm image to that of the investigated object image.
8 Citations
4 Claims
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1. A photometer for observation instruments, mainly microscopes, enabling simultaneous observation of an object being investigated and of a measuring diaphragm limiting the area being photometrically analyzed, comprising:
- a main optical path for observation of aN object, polarizing beam splitting means dividing said main path into an observation beam path and a measurement beam path, one of which is at an angle to the main path, apertured measuring diaphragm means in said measuring beam path, eyepiece means in said observation beam path for permitting visual observation of the images of said diaphragm means and said object;
said polarizing beam splitting means having at least three ports, linear polarizing means positioned in said beam splitter means common to both beam paths for linearly polarizing unpolarized images incident upon it of said object and said diaphragm, and for diverting linearly polarized images of said diaphragm and said object upon it to the other of said beam paths from which it is incident;
a specular reflecting means in each of said beam paths, said reflecting means in said measuring beam path reflecting the images of said object and said diaphragm to said linear polarizing means for reflection thereby to said eyepiece;
two light retarders, one placed in each beam path between said linear polarizing means and said reflecting means for changing the polarization of said images passed to it from said linear polarizing means and transmitted first by it to circular polarized light, and transmitted again, after reflection from said reflecting means, by it to said linear polarizing means as linear polarized light turned from the images'"'"''"'"' initial polarization direction, according to the orientation in the above said linear polarizing means;
whereby images of said object and said diaphragm linearly polarized in mutually different directions are passed to said eyepiece and light from said diaphragm means is precluded from passing along the main optical path to said object.
- a main optical path for observation of aN object, polarizing beam splitting means dividing said main path into an observation beam path and a measurement beam path, one of which is at an angle to the main path, apertured measuring diaphragm means in said measuring beam path, eyepiece means in said observation beam path for permitting visual observation of the images of said diaphragm means and said object;
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2. A photometer as claimed in claim 1, wherein a photoelectric receiver is positioned in said measuring beam path.
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3. A photometer as in claim 1, wherein a linear polarizing element is in the observation path so that upon rotation of said element about the axis of said path, the intensity of the images transmitted along said path will vary.
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4. A photometer as in claim 1, wherein illumination means are provided to illuminate said diaphragm in said main beam path via said polarization beam splitter means.
Specification
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Current AssigneeMaciej Popielas, Maksymilian Pluta, Wieslaw K. Borkowski
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Original AssigneeMaciej Popielas, Maksymilian Pluta, Wieslaw K. Borkowski
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InventorsBorkowski, Wieslaw K., Pluta, Maksymilian, Popielas, Maciej
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Primary Examiner(s)Wibert, Ronald L.
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Assistant Examiner(s)Webster, R. J.
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Application NumberUS05/030,798Time in Patent Office706 DaysField of Search356/115X 350/12-19,169-174,157US Class Current356/366CPC Class CodesG02B 21/0096 with photometer devices pho...
