PROCESS FOR THE PRODUCTION OF ANTIDAZZLE GLASS FILTERS

• US 3,652,318 A
• Filed: 11/13/1969
• Issued: 03/28/1972
• Est. Priority Date: 11/13/1969
• Status: Expired due to Term

• Current Assignee: Herbert Heins
• Original Assignee: Herbert Heins
• Inventors: Heins, Herbert
• Primary Examiner(s): Leavitt, Alfred L.
• Assistant Examiner(s): Glynn, Kenneth P.
• Application Number:
  US04/876,559
• Time in Patent Office: 866 Days
• Field of Search: 117/16R,16D,33.3,124A,DIG.10
• US Class Current: 427/167
• CPC Class Codes: C03C 17/245 by deposition from the vapour phase
• CPC Class Codes: C03C 2217/213 SiO2
• CPC Class Codes: C03C 2217/23 Mixtures
• CPC Class Codes: C03C 2217/24 Doped oxides
• CPC Class Codes: C03C 2218/151 by vacuum evaporation
• CPC Class Codes: C23C 14/10 Glass or silica

Abstract

Vacuum-coated antidazzle glass filters, such as sunglasses filters, are produced by adding elementary boron or a boronreleasing compound to silicon dioxide and evaporating the mixture onto glass under a vacuum. The minimum thickness of the coating formed by evaporation should be about 1.5 Mu . By adding a dyestuff to the mixture before evaporation, the degree of light absorption can be controlled.

Claims

2. A process as claimed in claim 1, wherein the ratio of elementary boron to silicon dioxide in the mixture is about 1:

5.

3. A process as claimed in claim 1, wherein chromium oxide is added to the mixture.

4. A process for the prOduction of vacuum coated glass filters, which comprises heating a mixture of silicon dioxide and an elementary boron releasing substance until said substance releases its boron and the evolved boron reacts with said silicon dioxide, and evaporating the boron-silicon dioxide reaction product onto glass under vacuum to form a coating on said glass.

5. A process as claimed in claim 4, wherein said substance is a silicon boride.

6. A process as claimed in claim 5, wherein said silicon boride is SiB4, SiB6 or SiB12.

7. A process as claimed in claim 4, wherein said substance is a metal boride.

8. A process as claimed in claim 7, wherein the metal boride is the boride of a metal whose metallic moiety, in elementary state, has a boiling point above 2,400* C.

9. A process as claimed in claim 7, wherein said metal boride is a boride of aluminum, beryllium, erbium, holmium, cerium, cobalt, chromium, copper, iron, gadolinium, germanium, hafnium, lanthanum, lutetium, molybdenum, niobium, neodymium, nickel, palladium, tantalum, tungsten, thorium, titanium, uranium, vanadium, zirconium, praseodymium, scandium, terbium, yttrium, manganese, calcium, strontium, barium.

10. A process as claimed in claim 7, wherein the metal boride is the boride of a metal, whose metallic moiety, in elementary state, has a specific gravity of above 9.

11. A process as claimed in claim 7, wherein the metal boride is AlB12, CaB6, SrB6, BaB6 or MnB4.

12. A process as claimed in claim 4, wherein the ratio of silicon dioxide to said substance, calculated on free boron, is about 5:

1.

13. A process as claimed in claim 4, wherein chromium oxide is added to the mixture.

14. A process as claimed in claim 1, wherein said coating has a thickness of at least about 1.5 Mu .

15. A process as claimed in claim 3, wherein said coating has a thickness of at least about 1.5 Mu .

16. A multi-step process for the production of vacuum coated glass filters, which comprises preparing a mixture of elementary boron and silicon dioxide, evaporating the reaction product formed from said boron and said silicon dioxide, depositing the evaporated reaction product on a substrate by sublimation, removing the sublimated substance from the substrate and evaporating said sublimated substance under vacuum onto glass to form a coating on said glass.

17. A multi-step process for the production of vacuum coated glass filters, which comprises heating a mixture of silicon dioxide and an elementary boron releasing substance until said substance releases its boron and the evolved boron reacts with said silicon dioxide, evaporating the reaction product formed from said boron and said silicon dioxide, depositing the evaporated reaction product on a substrate by sublimation, removing the sublimated substance from the substrate and evaporating said sublimated substance under vacuum onto glass to form a coating on said glass.

18. A multi-step process as claimed in claim 17, wherein said boron releasing substance is a silicon boride or a metal boride.

19. A multi-step process as claimed in claim 18, wherein said silicon boride is SiB4, SiB6 or SiB12 and said metal boride is the boride of aluminum, beryllium, erbium, holmium, cerium, cobalt, chromium, copper, iron, gadolinium, germanium, hafnium, lanthanum, lutetium, molybdenum, niobium, neodymium, nickel, palladium, tantalum, tungsten, thorium, titanium, uranium, vanadium, zirconium, praseodymium, scandium, terbium, yttrium, manganese, calcium, strontium, barium.