METHOD OF MAKING A MULTI-LAYER OPTICAL ISOLATION

• US 3,753,822 A
• Filed: 03/25/1971
• Issued: 08/21/1973
• Est. Priority Date: 03/25/1971
• Status: Expired due to Term

• Current Assignee: Philip L. Heinrich
• Original Assignee: Philip L. Heinrich
• Inventors: Heinrich, Philip L.
• Primary Examiner(s): Drummond, Douglas J.
• Application Number:
  US05/128,354
• Time in Patent Office: 880 Days
• Field of Search: 156/250,99,100,101,106 161/35,6
• US Class Current: 156/101
• CPC Class Codes: B29D 11/00634 Production of filters
• CPC Class Codes: B29D 11/0073 Optical laminates
• CPC Class Codes: G02B 5/283 designed for the ultraviolet
• CPC Class Codes: Y10T 156/1052 with cutting, punching, tearing or severing

Abstract

An optical reflector structure, with broad band rejection characteristics, for isolating a particular band of wavelengths of interest. The optical reflector comprises a stack of flat substrates, each one of which has a coating, which is reflective at the bandwidth of interest, disposed along at least one of its faces. The optical reflector structure is interposed into a beam of light with the planes of the coatings at a predetermined angle to the beam of light. In one embodiment the predetermined angle is 45*. The bandwidth of interest is reflected by a first set of the coatings to another set of coatings while the remaining light is absorbed by the substrates or opaque coatings on the substrates in one embodiment or by a coating of light-absorbing material disposed behind the reflective coating relative to the incident light in another embodiment.

Claims

2. A method of making an optical reflection filter as recited in claim 1 further comprising the step of affixing two such slabs in a back-to-back relationship with the edges of the substrates of one slab in parallel alignment with the edges of the substrates of the other slab.

3. A method of making an optical reflection filter as recited in claim 1 wherein the step of cutting slabs from the stack of substrates comprises cutting the slabs at an angle of substantially forty-five degrees to the planes of the parallel, plane surfaces of the substrates.