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SUBSTRATE POSITIONED DETERMINATION STRUCTURE AND METHOD

  • US 3,758,745 A
  • Filed: 09/07/1971
  • Issued: 09/11/1973
  • Est. Priority Date: 09/07/1971
  • Status: Expired due to Term
First Claim
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1. A substrate position determining apparatus comprising:

  • a. means for restraining a substrate having a first resistive strip and another element fixed to its surface, the first resistive strip being located in a predetermined position with respect to the other element, b. means adjacent the substrate position for progressively cutting the first resistive strip from one of its edges toward the other, thereby increasing its resistance, c. means for causing relative movement between the (b) means and substrate along a predetermined line so as to effect the progression of the cut, d. means for measuring the resistance of the first resistive strip transversely to the direction of movemenT, and e. means connected to the (d) means for reacting to the increase in measured resistance above a predetermined value to accurately register the relative position of the (b) means relative to a point on the first resistive strip. on the substrate.

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