LITHOGRAPHIC PRINTING PLATES AND PHOTORESISTS COMPRISING A PHOTOSENSITIVE POLYMER

• US 3,849,137 A
• Filed: 10/05/1972
• Issued: 11/19/1974
• Est. Priority Date: 10/12/1971
• Status: Expired due to Term

• Current Assignee: Dietrich Saenger, Helmut Barzynski, Mong-Jon Jun, Otto Volkert
• Original Assignee: Dietrich Saenger, Helmut Barzynski, Mong-Jon Jun, Otto Volkert
• Inventors: Jun, Mong-Jon, Saenger, Dietrich, Volkert, Otto, Barzynski, Helmut
• Primary Examiner(s): Smith, Ronald H.
• Application Number:
  US05/295,146
• Time in Patent Office: 775 Days
• Field of Search: 96/115R,85,86P,33,36.2,87,67 204/159.14
• US Class Current: 430/281.1
• CPC Class Codes: C08F 20/34 Esters containing nitrogen , e.g. N,N-dimethylaminoethyl (meth)acrylate
• CPC Class Codes: C08F 220/02 Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
• CPC Class Codes: C08F 222/00 Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
• CPC Class Codes: C08F 26/06 by a heterocyclic ring containing nitrogen
• CPC Class Codes: C08F 8/14 Esterification
• CPC Class Codes: G03F 7/039 Macromolecular compounds which are photodegradable, e.g. positive electron resists G03F7/075 takes precedence; macromolecular quinonediazides G03F7/023

Abstract

Photosensitive coating materials comprising polymers containing o-nitrocarbinol ester groups, particularly of polymers and copolymers of o-nitrocarbinol esters of ethylenically unsaturated carboxylic acids, which as a result of exposure become soluble in an alkaline solvent used as developer in which they were not soluble prior to exposure. Such materials are used in particular for coating lithographic printing plates and as photoresists.

Claims

1. A LITHOGRAPHIC PRINTING PLATE COMPRISING A SUPPORT AND A LAYER OF A PHOTOSENSITIVE COATING MATERIAL ON SAID SUPPORT, SAID MATERIAL CONSISTING ESSENTIALLY OF A POLYMER HAVING A MOLECULAR WEIGHT OF MORE THAN 500 AND CONTAINING IN THE MOLECULE SUCH AN AMOUNT BUT AT LEAST 5% BY WEIGHT, WITH REFERENCE TO THE MOLECULAR WEIGHT, OF AROMATIC OR HETEROAROMATIC ONITROCARBINOL ESTER GROUPS OF THE FORMULA I:

2. A photoresist comprising a substrate to be etched to which has been applied a photosensitive coating material consisting essentially of A polymer having a molecular weight of more than 500 and containing in the molecule such an amount but at least 5% by weight, with reference to the molecular weight, of aromatic or heteroaromatic o-nitrocarbinol ester groups of the formula I: