Semiconductor photoelectric generator
First Claim
1. A semiconductor photoelectric generator comprising semiconductor photocells each having a doped region, a base region, a metal current lead to said base region;
- a metal current lead to said doped region;
a working surface receiving incident radiation;
rectifying barriers, at least one of said rectifying barriers being provided at a distance from said working surface not exceeding the diffusion length of minority current carriers in said base region;
isotype p-p+ or n-n+ junctions provided in direct proximity to said working surface;
said photocells having the shape of parallelepipeds, at least one linear dimension thereof being commensurate with the diffusion length of minority current carriers in said base region;
all said current leads interconnecting said photocells into a generator.
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Abstract
A semiconductor photoelectric generator comprising interconnected photocells with rectifying barriers, with isotype junctions in the base region and with current leads in the regions adjacent the rectifying barriers. Each photocell has a working surface, receiving incident radiation. The isotype junctions in the photocells are provided in direct proximity to the working surfaces of the photocells. At least one rectifying barrier in each photocell is provided at a distance from the working surface not exceeding the diffusion length of minority current carriers in the base region. The photocells can have the shape of microminiature parallelepipeds having at least two dimensions commensurate with the diffusion length of minority current carriers in the base region.
57 Citations
8 Claims
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1. A semiconductor photoelectric generator comprising semiconductor photocells each having a doped region, a base region, a metal current lead to said base region;
- a metal current lead to said doped region;
a working surface receiving incident radiation;
rectifying barriers, at least one of said rectifying barriers being provided at a distance from said working surface not exceeding the diffusion length of minority current carriers in said base region;
isotype p-p+ or n-n+ junctions provided in direct proximity to said working surface;
said photocells having the shape of parallelepipeds, at least one linear dimension thereof being commensurate with the diffusion length of minority current carriers in said base region;
all said current leads interconnecting said photocells into a generator. - View Dependent Claims (2, 3)
- a metal current lead to said doped region;
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4. A semiconductor photoelectric generator built around semiconductor photocells, each of said photocells comprising;
- a doped region;
a base region;
a metal current lead to said base region;
a metal current lead to said doped region;
a working surface receiving incident radiation;
rectifying barriers, at least one of said rectifying barriers being provided at a distance from said working surface not exceeding the diffusion length of minority current carriers to said base region;
an isotype p-p+or n-n+ junction provided in direct proximity to said working surface;
an additional isotype junction, disposed parallel to the face that is inclined at an angle to said working surface;
said photocells having the shape of microminiature parallelepipeds of which at least two linear dimensions are commensurate with the diffusion length of minority current carriers to said base region;
all said current leads interconnecting said photocells into a generator. - View Dependent Claims (5, 6, 7)
- a doped region;
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8. A semiconductor photoelectric generator built around semiconductor photocells, each photocell comprising:
- a doped region;
a base region;
a working region which receives incident radiation;
a metal current lead to said base region disposed over the entire area of the surface that is opposite to said working surface;
a metal current lead to said doped region;
rectifying barriers disposed parallel to the faces that are inclined at a certain angle to said working surface;
an isotype p--p+ or n--n+ junction disposed in direct proximity to said working surface;
an additional isotype junction disposed parallel and in direct proximity to the surface that is opposite the said working surface;
said photocells having the shape of microminiature parallelepipeds having at least two linear dimensions commensurate with the diffusion length of minority current carriers in said base region;
all said current leads interconnecting said photocells into a generator.
- a doped region;
Specification