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Photomasks with antistatic control

  • US 3,949,131 A
  • Filed: 06/19/1974
  • Issued: 04/06/1976
  • Est. Priority Date: 06/19/1974
  • Status: Expired due to Term
First Claim
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1. A photomask for use in photolithographic processing of semiconductor microcircuits comprising a rigid, transparent plate, a patterned photomask coating on the plate, the coating having void spaces representing a positive or negative image of at least partial features of said microcircuit, a continuous, transparent, electrically conductive film covering the photomask pattern and the void spaces, and electrical contact means for electrically grounding the film.

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