×

Pattern preliminary processing system

  • US 3,973,239 A
  • Filed: 10/15/1974
  • Issued: 08/03/1976
  • Est. Priority Date: 10/17/1973
  • Status: Expired due to Term
First Claim
Patent Images

1. A pattern preliminary processing system comprising filtering means for filtering pattern signals by means of a mask, the weight of the respective regions on the mask being nearly symmetrical with respect to the center of the mask and the total weight of all regions of the mask being nearly zero so as to emphasize the variations in shade along the boundary between the pattern and background, first bi-valuing means for dividing the output of said filtering means into two values at a first threshold level, second bi-valuing means for dividing the output of said filtering means into two values at a second threshold level lower than said first threshold level, and means for classifying pattern signals between said first and second threshold levels into a first state and a second state by reference to the signal level of small regions adjacent to the regions corresponding to said pattern signals, said first state including signals above said first threshold level, said second state including signals under said second threshold level.

View all claims
  • 0 Assignments
Timeline View
Assignment View
    ×
    ×