Method for the production of semiconductor devices with an integral heatsink and of related semiconductor equipment
First Claim
1. A process for the production of a semiconductor device with an integral heatsink, starting with a sheet of semiconductor material having a P / N junction, comprising the steps ofuniformly coating both surfaces of the sheet of semiconductor material with a layer of dielectric,removing by photoetching from a finite number of zones the layer of dielectric from one surface of said sheet to form a finite number of locations for the sinks,coating the finite number of zones with a first flexible metal layer,depositing a metal layer over said first flexible metal layer at the approximate areas of said zones to establish the sink formation,bonding the said one surface of said sheet and its associated coatings with an adhesive to a support,thinning down the other surface of said sheet of semiconductor material,depositing a second flexible metal layer over said other surface of said sheet,and removing semiconductor material from the body of said sheet in the intersticial spaces between and among the said zones to produce the separation of the semiconductor units with Mesa profiles which are equipped with sinks.
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Abstract
A process for producing a semiconductor device with an integral heatsink involving applying a coating of dielectric to a sheet of semiconductor material, removing part of the dielectric coating by etching to leave specific sink zones, coating the zones with a metal layer, bonding the assembly to a support with adhesive, depositing a layer of metal to the non-adhered surface of the semiconductor sheet in areas corresponding to the sink zones, and removing semiconductor material from the body of the sheet between the sink zones to produce mesa profile units with heatsinks.
21 Citations
15 Claims
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1. A process for the production of a semiconductor device with an integral heatsink, starting with a sheet of semiconductor material having a P / N junction, comprising the steps of
uniformly coating both surfaces of the sheet of semiconductor material with a layer of dielectric, removing by photoetching from a finite number of zones the layer of dielectric from one surface of said sheet to form a finite number of locations for the sinks, coating the finite number of zones with a first flexible metal layer, depositing a metal layer over said first flexible metal layer at the approximate areas of said zones to establish the sink formation, bonding the said one surface of said sheet and its associated coatings with an adhesive to a support, thinning down the other surface of said sheet of semiconductor material, depositing a second flexible metal layer over said other surface of said sheet, and removing semiconductor material from the body of said sheet in the intersticial spaces between and among the said zones to produce the separation of the semiconductor units with Mesa profiles which are equipped with sinks.
Specification