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Silicon sensitized rare earth oxysulfide phosphors

  • US 3,980,887 A
  • Filed: 04/11/1975
  • Issued: 09/14/1976
  • Est. Priority Date: 08/27/1973
  • Status: Expired due to Term
First Claim
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1. An X-ray intensifying screen comprising a substrate having coated on a surface thereof a plurality of particles of a rare earth oxysulfide phosphor consisting essentially of a rare earth oxysulfide matrix of the formula M2-x O2 S:

  • xA wherein M is at least one rare earth element selected from the group consisting of lanthanum, gadolinium and yttrium, A is at least one rare earth activator selected from the group consisting of praseodymium, neodymium, samarium, europium, terbium, dysprosium, holmium, erbium, ytterbium, and thulium, and x is 0.001 to 0.1, silicon incorporated in said matrix in an amount from about 10 to 1,000 p.p.m. based on phosphor weight and, when M is gadolinium or yttrium, fluorine incorporated in said matrix in an amount from about 20 to 500 p.p.m.

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