Metal-clad laminates
First Claim
1. A method for preparing a metal-clad laminate which comprises applying a release agent to a surface of a substrate, plating said surface with a conductive metal to a thickness of from 1 to about 20 microns, thereafter subjecting the resultant conductive metal layer to a high current density to roughen the exposed surface of the metal, then oxidizing said surface, thereafter contacting said surface with a bonding agent, bonding the thus treated conductive metal to a laminate, removing said substrate, and recovering the resultant metal-clad laminate.
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Abstract
Metal-clad laminates in which the metal coating of the laminate is only from about 1 micron to about 20 microns in thickness are prepared by depositing a copper coating on a substrate which has been treated with a release agent, treating the upper side of the metal layer to improve the adhesive properties of the metal, thereafter bonding the metal coating to a laminate and removing the substrate to thus prepare the desired metal-clad laminate.
85 Citations
24 Claims
- 1. A method for preparing a metal-clad laminate which comprises applying a release agent to a surface of a substrate, plating said surface with a conductive metal to a thickness of from 1 to about 20 microns, thereafter subjecting the resultant conductive metal layer to a high current density to roughen the exposed surface of the metal, then oxidizing said surface, thereafter contacting said surface with a bonding agent, bonding the thus treated conductive metal to a laminate, removing said substrate, and recovering the resultant metal-clad laminate.
Specification