Solution for chemical dissolution treatment of tin or alloys thereof

• US 3,986,970 A
• Filed: 04/26/1974
• Issued: 10/19/1976
• Est. Priority Date: 05/02/1973
• Status: Expired due to Term

• Current Assignee: Furukawa Electric Company Limited
• Original Assignee: Furukawa Electric Company Limited
• Inventors: Shiga, Shoji
• Primary Examiner(s): Powell, William A.
• Application Number:
  US05/464,295
• Time in Patent Office: 907 Days
• Field of Search: 252/79.1-79.5, 252/142, 156/3, 156/7, 156/18, 156/20, 75/97 R, 75/97 A, 75/98, 134/3, 134/41
• US Class Current: 252/79.3
• CPC Class Codes: C23F 1/30 for etching other metallic material
• CPC Class Codes: C23F 1/44 Compositions for etching metallic material from a metallic material substrate of different composition

Abstract

A solution for chemical dissolution treatment (for example, pickling, etching, chemical milling, chemical polishing or leaching) of tin or its alloys which comprises an aqueous solution of an acid, an oxidizing agent and 0.001 to 10 mole/l of at least one inorganic compound selected from the group consisting of fluorides, inorganic fluoric complex salts, titanium salts, trivalent chromium salts, iron salts, antimony salts and vanadium salts.

Claims

1. A solution for chemical dissolution treatment of tin or alloys thereof which comprises an aqueous solution consisting of 0.03 to 10 mole/l of an oxidizing agent, 0.1 to 10 gram ion/l in terms of hydrogen ion concentration of an acid, wherein the acid is at least one selected from the group consisting of sulfuric acid, sulfamic acid, phosphoric acid, hydrochloric acid and acetic acid, and 0.001 to 10 mole/l of at least one tin ion-stabilizing agent selected from the group consisting of an inorganic fluoric complex salt containing a fluorine atom as a ligand, a titanium salt, a trivalent chromium salt and a vanadium salt.

2. A solution for chemical dissolution treatment of tin or alloys thereof according to claim 1 wherein the tin ion-stabilizing agent is at least one compound selected from the group consisting of sodium fluoroborate, sodium hexafluorosilicate, potassium hexafluorotitanate, potassium hexafluorozirconate, artificial cryolite, titanium monosulfate, titanium disulfate, titanium trichloride, chromium sulfate, chromium alum, ammonium metavanadate and sodium orthovanadate.

3. A solution for chemical dissolution treatment of tin or alloys thereof according to claim 1 wherein the tin ion-stabilizing agent is a mixture of an inorganic fluoric complex salt containing a fluorine atom as a ligand and at least one compound selected from the group consisting of a titanium salt, a trivalent chromium salt, and a vanadium salt, said mixture being present in an amount of 0.001 to 10 mole/l.

4. A solution for chemical dissolution treatment of tin or alloys thereof according to claim 1 wherein the oxidizing agent is a peroxide.

5. A solution for chemical dissolution treatment of tin or alloys thereof according to claim 4 wherein the peroxide is hydrogen peroxide.

6. A solution for chemical dissolution treatment of tin or alloys thereof according to claim 4 wherein a peroxide-stabilizing agent is present.

7. A solution for chemical dissolution treatment of tin or alloys thereof according to claim 1 wherein the oxidizing agent is a salt of a metal having a nobler ionization tendency than tin.

8. A solution for chemical dissolution treatment of tin or alloys thereof according to claim 7 wherein the metal salt is a copper salt.

9. A solution for chemical dissolution treatment of tin or alloys thereof which comprises an aqueous solution comprising 0.03 to 10 mole/l of hydrogen peroxide, 0.1 to 10 gram ion/l in terms of hydrogen ion concentration of an acid selected from the group consisting of sulfuric acid, sulfamic acid, phosphoric acid, hydrochloric acid and acetic acid, and 0.001 to 10 mole/l of at least one tin ion-stabilizing agent selected from the group consisting of sodium fluoroborate, sodium hexafluorosilicate, potassium hexafluorotitanate, potassium hexafluorozirconate, artificial cryolite, titanium monosulfate, titanium disulfate, titanium trichloride, chromium sulfate, chromium alum, ammonium metavanadate and sodium orthovanadate.