Apparatus for forming grooves on a wafer by use of a laser

• US 3,991,296 A
• Filed: 11/12/1975
• Issued: 11/09/1976
• Est. Priority Date: 11/15/1974
• Status: Expired due to Term

• Current Assignee: Nippon Electric Company Limited (NEC Corporation)
• Original Assignee: Nippon Electric Company Limited (NEC Corporation)
• Inventors: Suga, Hiroshi, Kojima, Yoshitomo
• Primary Examiner(s): Truhe, J. V.
• Assistant Examiner(s): Peterson, G. R.
• Application Number:
  US05/631,217
• Time in Patent Office: 363 Days
• Field of Search: 219/121 L, 219/121 LM, 219/121 M, 331/94.5 R
• US Class Current: 219/121.68
• CPC Class Codes: B23K 26/146 the fluid stream containing a liquid
• CPC Class Codes: Y10S 438/94 Laser ablative material removal

Abstract

An apparatus for forming grooves in a semiconductor wafer by the use of a laser beam includes a movable stage on which the wafer is mounted and a transparent member mounted on the stage in a sealed manner and covering the wafer. A liquid is introduced into the space defined between the wafer and the transparent member.

Claims

1. An apparatus comprising a stage movable at least in one direction, means for holding a wafer on said stage, a transparent member covering said wafer, means for sealedly mounting said transparent member on said stage, a space being defined between the wafer and said transparent member, means for filling said space with a transparent liquid which is harmless against the wafer, and a source of a laser beam located above said transparent member;

wherein the wafer is held on said stage and covered with said transparent member, and said space between the wafer and said transparent member is filled with a transparent liquid followed by the irradiation of said laser beam to predetermined surface areas of the wafer through said transparent member and the transparent liquid with movement of said stage to make grooves on the wafer.

2. The apparatus of claim 1, in which said filling means includes a liquid inlet port and a liquid outlet port, and means for causing the transparent liquid to flow at a velocity of between 1.5 and 4.5 meters/sec during the irradiation of said laser beam.

3. A semiconductor wafer scribing apparatus using a laser beam comprising a stage movable at least in opposite directions, means for carrying a semiconductor wafer on said stage, a transparent cover for said semiconductor wafer, means for sealedly mounting said transparent cover on said stage, a space being formed between the wafer and said transparent cover, means for passing a liquid through said space between the wafer and said transparent cover, and a laser beam source located above said transparent cover, wherein the semiconductor wafer is mounted on said stage and covered with said transparent cover, and a liquid is made continuously to flow through said space between the wafer and said transparent cover followed by the irradiation of said laser beam to predetermined areas of the semiconductor wafer surface through said transparent member and liquid with movement of said stage to scribe the surface of the semiconductor wafer without fusing semiconductor debris to the semiconductor wafer.

4. A semiconductor wafer scribing apparatus of claim 3, wherein said liquid passing means includes a water inlet port and a water outlet port, and means for causing the liquid to flow at a velocity of between 1.5 and 4.5 meters/sec during the irradiation of said laser beam.