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Reflection elimination system

  • US 4,007,979 A
  • Filed: 04/18/1975
  • Issued: 02/15/1977
  • Est. Priority Date: 04/18/1975
  • Status: Expired due to Term
First Claim
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1. In a device including a material which partially polarizes radiation passing through it, said material having a P axis and an S axis, the improvement which comprises a retarder and a linear polarizer for imparting an elliptical polarization to radiation passing through the retarder and the linear polarizer, said retarder having a fast axis and a slow axis, said fast axis being aligned parallel to one of said P and S axes of said material, the retardance of the combination of said retarder and said material being approximately a quarter wave, said linear polarizer having a pass axis, said pass axis being placed at an angle φ

  • with respect to the P axis of said material, where φ

    is determined from the formula tan2 φ

    = |tp2 /ts2 |, in which tp is the amplitude transmittance of the material for light polarized in the P direction, and ts is the amplitude transmittance of the material for light polarized in the S direction.

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