Reducing the reflectance of surfaces to radiation

• US 4,013,465 A
• Filed: 02/09/1976
• Issued: 03/22/1977
• Est. Priority Date: 05/10/1973
• Status: Expired due to Term

• Current Assignee: The secretary of state for defence in her Britannic Majesty's Government of the United Kingdom of Great Britain And Northern Ireland
• Original Assignee: The secretary of state for defence in her Britannic Majesty's Government of the United Kingdom of Great Britain And Northern Ireland
• Inventors: Hutley, Michael Christopher, Clapham, Peter Brian
• Primary Examiner(s): Kimlin, Edward C.
• Application Number:
  US05/656,757
• Time in Patent Office: 407 Days
• Field of Search: 96/35.1, 96/36, 96/38.3, 96/27 H, 96/27 R, 96/79, 96/84, 350/3.5, 350/162 R, 350/160 R, 350/276 R
• US Class Current: 430/11
• CPC Class Codes: C03C 15/00 Surface treatment of glass, not in the form of fibres or filaments, by etching etching or surface-brightening compositions, in general C09K13/00
• CPC Class Codes: G02B 1/113 using inorganic layer materials only
• CPC Class Codes: G02B 1/118 having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
• CPC Class Codes: G02B 1/12 by surface treatment, e.g. by irradiation
• CPC Class Codes: G03F 7/001 Phase modulating patterns, e.g. refractive index patterns
• CPC Class Codes: H01L 31/0236 Special surface textures
• CPC Class Codes: Y02E 10/50 Photovoltaic [PV] energy

Abstract

A method of producing a surface having a reduced reflectance to electromagnetic radiation in a predetermined wavelength band which comprises arranging on the surface a regular array of protuberances having a height which is not less than one third of the length of the longest wavelength in the band and at a spacing which is less than the length of the shortest wavelength of the band divided by the refractive index of the material of which the protuberances consist.

Claims

1. A photo-exposure method for reducing the reflectance of a surface to electromagnetic radiation in a predetermined wavelength band which comprises applying a layer of photosensitive material to said surface, exposing the photosensitive layer to a regular pattern of light to which it is sensitive, and processing the exposed photosensitive layer to convert the effect of said light pattern on said photosensitive layer into a regular array of protuberances on said surface having a height which is not less than one third of the length of the longest wavelength in the band and at a spacing between adjacent protuberances which is less than the length of the shortest wavelength of the band divided by the refractive index of the material of which the protuberances consist.

2. A method according to claim 1 wherein said electromagnetic radiation is visible radiation and said surface is the surface of an optical component, said regular pattern of light including dark interference fringes, said processing step comprising developing the photosensitive material following said exposing step to cause the topography of the surface of the developed material to be related to the pattern of light through a difference in surface level between the portions of said photosensitive material which are exposed to higher and to lower intensity of light in said pattern respectively.

3. A method according to claim 2 for reducing the reflection of visible radiation by the surface of an optical component which includes the step, following said developing step, of exposing the layer of developed material and the surface under it to a process of erosion whereby the topography of the surface is related to the pattern of light through preferential erosion of the surface in locations where the developing step has reduced the thickness of said material.

4. A method according to claim 3 in which the process of erosion is an etching process.

5. A method according to claim 3 in which the process of erosion is a process of ion beam erosion.

6. A method according to claim 2 in which the regular pattern of light comprises a set of straight line interference fringes on the layer of photosensitive material.

7. A method according to claim 2 in which the regular pattern of light comprises two sets of straight line interference fringes arranged at an angle, in the range of about 20°

to about 90°

to each other on the layer of photosensitive material.

8. A method according to claim 7 in which each set of interference fringes is produced by the intersection of two coherent beams of radiation derived from a laser.

9. A method according to claim 2 in which the photosensitive material is photoresist, parts of which are dissolved away in the photographic process of development to leave said array of protuberances.

10. An article having a surface with a reduced reflectance produced in accordance with the method of claim 1.

11. An article which has a regular array of protuberances produced on a surface by a method according to claim 2.

12. An article according to claim 10 in which the refractive index of the material of the protuberances is equal to the refractive index of the material of the surface.

13. An article according to claim 10 in which the surface is opaque to radiation in the predetermined wavelength band.

14. An article according to claim 10 which is an optical lens.

15. An article according to claim 10 in which the surface and array of protuberances are coated with a thin film of metal whereby the reflectance of the surface to visible wavelengths is reduced relative to the reflectance to infra-red wavelengths.

16. An article according to claim 15 in which the metal is gold.