Fabrication of high aspect ratio masks
First Claim
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1. A method of manufacturing a mask characterized by an aspect ratio ≦
- 1 comprising the steps of;
a. providing a mask of aspect ratio ≦
1 on a substrate transparent to radiation, said mask defined by selective areas absorbent of said radiation and,b. coating said mask with material which becomes insoluble in a developer in response to said radiation,c. exposing said mask and said material to said radiation with said substrate located between said mask and a source of said radiation,d. developing said material, ande. plating masking material absorbent to said radiation in areas in which said radiation responsive material was removed by said developing whereby the height of said radiation absorbent masking material is increased to thereby increase the aspect ratio of said mask.
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Abstract
A method of constructing masks characterized by a high aspect ratio. The method includes at least a single exposure of a mask by radiation which is transmitted by the substrate before impinging on the resist. In a specific embodiment the mask is partially completed and the already deposited mask modulates the radiation transmitted by the substrate before it exposes the resist.
46 Citations
18 Claims
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1. A method of manufacturing a mask characterized by an aspect ratio ≦
- 1 comprising the steps of;
a. providing a mask of aspect ratio ≦
1 on a substrate transparent to radiation, said mask defined by selective areas absorbent of said radiation and,b. coating said mask with material which becomes insoluble in a developer in response to said radiation, c. exposing said mask and said material to said radiation with said substrate located between said mask and a source of said radiation, d. developing said material, and e. plating masking material absorbent to said radiation in areas in which said radiation responsive material was removed by said developing whereby the height of said radiation absorbent masking material is increased to thereby increase the aspect ratio of said mask. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
- 1 comprising the steps of;
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14. A method of increasing the aspect ratio of a mask, having an aspect ratio less than 1, to an aspect ratio greater than 1, in which the mask, whose aspect ratio is to be increased is formed of a material absorptive of X-radiation on a substrate transmissive of X-radiation, said method comprising the steps of:
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a. coating said mask with a material which becomes insoluble in a developer in response to said X-radiation; b. exposing said mask and said material to X-radiation with said substrate located between said mask and a source of X-radiation; c. developing said material; and
,d. plating additional masking material, absorbent to X-radiation, in areas in which said radiation responsive material was removed by said developing whereby the height of said radiation absorbent masking material is increased to thereby increase the aspect ratio of said mask. - View Dependent Claims (15, 16, 17, 18)
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Specification