Optical microcircuit printing process

• US 4,023,904 A
• Filed: 01/12/1976
• Issued: 05/17/1977
• Est. Priority Date: 07/01/1974
• Status: Expired due to Term

• Current Assignee: Tamarack Scientific Co., Inc. (SÜSS MicroTec SE)
• Original Assignee: Tamarack Scientific Co., Inc. (SÜSS MicroTec SE)
• Inventors: Sheets, Ronald E.
• Primary Examiner(s): Wintercorn, Richard A.
• Application Number:
  US05/648,370
• Time in Patent Office: 491 Days
• Field of Search: 350/162, 350/211, 355/77, 355/78, 355/71, 355/132, 355/46, 355/73, 355/48, 250/475, 250/492 A, 250/482
• US Class Current: 355/132
• CPC Class Codes: G03F 7/701 Off-axis setting using an aperture
• CPC Class Codes: G03F 7/7035 Proximity or contact printers
• CPC Class Codes: G03F 7/70583 Speckle reduction, e.g. coherence control or amplitude/wavefront splitting

Abstract

A process is disclosed for exposing to ultraviolet light a semi-conductor or hybrid substrate coated with photo-resist, in back of a mask having bars and very narrow slits, the diffraction patterns ordinarily experienced at the substrate being virtually eliminated through use, between the light source and the mask, of a light integrator comprised of two successive matrixes of very small lenses or lenticules. The lenticules form a large number of magnified, superimposed, slightly displaced images of the light source in the plane of the substrate; and when the slitted mask is interposed, this light forms a large number of diffraction patterns on the substrate which, because of their large number, superimposition, and slight displacement, results in extreme uniformity of light intensity and sharp resolution throughout the pattern of light on the substrate. A variable aperture is used in connection with the light integrator, and controls the half-angle of collimation by a collimator lens placed between the light integrator and the mask. Means are also provided for modifying the aperture pattern of this aperture plate changing it, for example, to one or more off-axis sub-apertures. A field lens is also used to improve superimposition of the lenticule images on the target.

Claims

1. The process of exposing a photosensitive target surface to ultraviolet light, that comprises:

collecting light emitted from an arc source and bringing it to a focus in the plane of the first lenticule matrix of a double lenticule matrix light integrator,

forming by the lenticules of the second matrix multiple, magnified and superimposed images of the illuminated lenticules of the first matrix on said target surface,

establishing a secondary light source by forming an aperture for the light going through said integrator at a plane in proximity to the latter,

collimating the light from said source and which forms said images by passing said light through a collimating lens,

regulating the angle of collimation of said light by selectively adjusting the area of said light source, and

positioning a mask with a geometric pattern of diffraction slits immediately in front of said target surface.

2. The method of claim 1, including masking out selected areas of said secondary light source.

3. The process of claim 1, including masking out selected portions of the secondary light source immediately around the longitudinal axis thereof.

4. The process of claim 1, including adjusting the area of the secondary source of light by masking out an outer rim portion of the secondary light source area.

5. The process of claim 1, including adjusting the area of the secondary source of light so as to pass substantial light only in selected regions thereof spaced outside and about the longitudinal optic axis thereof.

6. The process of claim 1, including adjusting the area of said secondary source of light by masking out a selected area thereof spaced outside and about the longitudinal optic axis thereof, and spaced radially from the longitudinal optic axis thereof.

7. The process of claim 1, including aperturing down the secondary source of light to adjust its area and thereby the collimation angle of the beam.

8. The process of claim 1, including variously aperturing said source of light to control the amount of diffraction of the light from said source by said slits.

9. The process of claim 1, including variously aperturing said source of light to control the degree of uniformity of intensity of diffracted light received at said target plane.

10. The process of claim 1, including masking said aperture in the center thereof to reduce the proportion of parallel and near parallel light delivered by said collimator lens.

11. The method according to claim 1, and in addition, refracting the rays from the light integrator inwardly toward the optic axis, with the rays from the individual lenticules of the first lenticule matrix refracted progressively through greater angles with increasing distances of the lenticules from the optic axis such as to provide superimposed images of the first matrix lenticules on the target plane.