Optical microcircuit printing process
First Claim
1. The process of exposing a photosensitive target surface to ultraviolet light, that comprises:
- collecting light emitted from an arc source and bringing it to a focus in the plane of the first lenticule matrix of a double lenticule matrix light integrator,forming by the lenticules of the second matrix multiple, magnified and superimposed images of the illuminated lenticules of the first matrix on said target surface,establishing a secondary light source by forming an aperture for the light going through said integrator at a plane in proximity to the latter,collimating the light from said source and which forms said images by passing said light through a collimating lens,regulating the angle of collimation of said light by selectively adjusting the area of said light source, andpositioning a mask with a geometric pattern of diffraction slits immediately in front of said target surface.
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Accused Products
Abstract
A process is disclosed for exposing to ultraviolet light a semi-conductor or hybrid substrate coated with photo-resist, in back of a mask having bars and very narrow slits, the diffraction patterns ordinarily experienced at the substrate being virtually eliminated through use, between the light source and the mask, of a light integrator comprised of two successive matrixes of very small lenses or lenticules. The lenticules form a large number of magnified, superimposed, slightly displaced images of the light source in the plane of the substrate; and when the slitted mask is interposed, this light forms a large number of diffraction patterns on the substrate which, because of their large number, superimposition, and slight displacement, results in extreme uniformity of light intensity and sharp resolution throughout the pattern of light on the substrate. A variable aperture is used in connection with the light integrator, and controls the half-angle of collimation by a collimator lens placed between the light integrator and the mask. Means are also provided for modifying the aperture pattern of this aperture plate changing it, for example, to one or more off-axis sub-apertures. A field lens is also used to improve superimposition of the lenticule images on the target.
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Citations
11 Claims
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1. The process of exposing a photosensitive target surface to ultraviolet light, that comprises:
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collecting light emitted from an arc source and bringing it to a focus in the plane of the first lenticule matrix of a double lenticule matrix light integrator, forming by the lenticules of the second matrix multiple, magnified and superimposed images of the illuminated lenticules of the first matrix on said target surface, establishing a secondary light source by forming an aperture for the light going through said integrator at a plane in proximity to the latter, collimating the light from said source and which forms said images by passing said light through a collimating lens, regulating the angle of collimation of said light by selectively adjusting the area of said light source, and positioning a mask with a geometric pattern of diffraction slits immediately in front of said target surface. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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Specification