Biaxial capacitance strain transducer

• US 4,030,347 A
• Filed: 10/31/1975
• Issued: 06/21/1977
• Est. Priority Date: 10/31/1975
• Status: Expired due to Term

• Current Assignee: Electrical Power Research Institute
• Original Assignee: Electrical Power Research Institute
• Inventors: Yeakley, Lester M., Norris, Elwood B.
• Primary Examiner(s): Ruehl, Charles A.
• Application Number:
  US05/627,590
• Time in Patent Office: 599 Days
• Field of Search: 73/88.5 R, 317/246, 340/200, 323/93
• US Class Current: 73/769
• CPC Class Codes: G01B 7/22 using change in capacitance

Abstract

A biaxial capacitance strain transducer in the form of a laminated structure defining two capacitance strain transducers in orthogonal orientation. Each capacitance strain transducer comprises driven capacitance plates which are excited by an oscillator and a sensing capacitance plate disposed in spaced parallel relation to the driven capacitance plates. A shutter mechanism in the form of a pair of apertured plates is provided between the driven plates and the sensing plates. The ends of the apertured plates extend out of the laminated structure and are attached to the surface wherein strain is to be measured. Strain will produce relative displacement of the apertured plates, resulting in variation in the capacitive coupling between the sensing and driven plates through the apertures. This differential capacitance, which is thus related to the strain to be measured, is detected and measured by suitable electronic instrumentation.

Claims

1. A multiaxial capacitance strain transducer comprising:

a stack of at least three support wafers defining at least two slots therebetween, a first capacitance strain transducer formed in one of said slots including at least one capacitance varying element slidably carried in said one slot and extending outwardly therefrom, a second capacitance strain transducer formed in the other of said slots including at least one capacitance varying element slidably carried in said other slot and extending outwardly therefrom, said second capacitance strain transducer being angularly offset with respect to said first capacitance strain transducer by a predetermined angle and coupling means connecting the outwardly extending portions of said capacitance varying elements with the surface wherein strain is to be measured.

2. Apparatus according to claim 1 wherein said predetermined angle is substantially 90°

rendering the stress response axes of said first and second capacitance strain transducers orthogonal.

3. Apparatus according to claim 1 wherein said coupling means comprises a plurality of spacers corresponding in thickness to the distances between the outwardly extending portions of said capacitance varying elements and the surface wherein strain is to be measured.

4. Apparatus according to claim 1 wherein each of said first and second capacitance strain transducers comprises at least one driven capacitance plate carried on the surface of one of said support wafers interior of said slot and a sensing capacitance plate carried on the surface of the other of said support wafers interior of said slot in parallel spaced relation to said driven capacitance plate, said capacitance varying element being diposed therebetween.

5. Apparatus according to claim 4 comprising oscillator means for applying an A.C. carrier signal to each of said driven capacitance plates and detector means for detecting the A.C. carrier signals coupled to each of said sensing capacitance plates through said respective capacitance varying elements.

6. A multiaxial capacitance strain transducer comprising:

a stack of at least three support wafers defining at least two slots therebetween, a first capacitance strain transducer formed in one of said slots, a second capacitance strain transducer formed in the other of said slots, each of said first and second capacitance strain transducers comprising a pair of driven capacitance plates carried on the surface of one of said support wafers interior of said slot, a sensing capacitance plate carried on the surface of the other of said support wafers interior of said slot in parallel spaced relation to said driven capacitance plates and shutter means disposed between said driven capacitance plates and said sensing capacitance plates for varying the differential capacitance therebetween in response to the displacement of said shutter means, said first capacitance strain transducer being oriented orthogonally with respect to said second capacitance strain transducer.

7. Apparatus according to claim 6 wherein said shutter means comprises a pair of apertured plates having at least one aperture, the apertures of one of said apertured plates partially overlapping the apertures of the other of said apertured plates to define capacitance slots therethrough, the dimensions of said capacitance slots varying upon relative displacement of said apertured plates.

8. Apparatus according to claim 7 wherein said apertured plates extend outwardly from said slot on opposite sides thereof, and means for coupling the outwardly extending portions of said apertured plates with the surface wherein strain is to be measured.

9. Apparatus according to claim 8 wherein said coupling means comprises a pair of spacers corresponding in thickness to the distances between the outwardly extending portions of said apertured plates and the surface wherein strain is to be measured.

10. Apparatus according to claim 7 wherein said driven capacitance plates comprise a plurality of elongate parallel spaced-apart projections, the projections of one of said driven capacitance plates being interposed between the projections of the other of said driven capacitance plates.

11. Apparatus according to claim 10 wherein the apertures of said apertured plates are generally rectangular, forming a plurality of elongate generally rectangular capacitance slots respectively aligned with the projections of said driven capacitance plates.

12. Apparatus according to claim 10 wherein said sensing capacitance plate is generally rectangular corresponding to the area of said driven capacitance plate comprising said projections.

13. Apparatus according to claim 6 comprising oscillator means for applying A.C. carrier signals to said driven capacitance plates, the signal applied to one of said driven capacitance plates being 180°

out-of-phase with respect to the signal applied to the other of said driven capacitance plates, and phase-sensitive detector means for detecting the magnitude and phase of the signals coupled to said sensing capacitance plate through said shutter means.

14. Apparatus according to claim 13 wherein said detector means comprises a charge amplifier connected to said sensing capacitance plate, and feedback means coupling the output and input of said charge amplifier to produce a virtual ground potential at the amplifier input.

15. Apparatus according to claim 14 wherein said feedback means comprises a capacitor.

16. Apparatus according to claim 14 comprising a phase-sensitive demodulator connected to the output of said charge amplifier.

17. A capacitance strain transducer comprising at least two support wafers defining a slot therebetween, a pair of driven capacitance plates carried on the surface of one of said support wafers interior of said slot, a sensing capacitance plate carried on the surface of the other of said support wafers interior of said slot in parallel spaced relation to said driven capacitance plates and shutter means disposed between said driven capacitance plates and said sensing capacitance plate, said shutter means comprising a pair of apertured plates each having at least one aperture, the apertures of one of said apertured plates partially overlapping the apertures of the other of said apertured plates to define capacitance slots therethrough, the dimensions of said capacitance slots varying upon relative displacement of said apertured plates for varying the differential capacitance therebetween in response to displacement to said shutter means, said apertured plates extending outwardly from said slot on opposite sides thereof, and means for coupling the outwardly extending portions of said apertured plates with the surface wherein strain is to be measured.

18. Apparatus according to claim 17 wherein said coupling means comprises a pair of spacers corresponding in thickness to the distance between the outwardly extending portions of said apertured plates and the surface wherein strain is to be measured.

19. A capacitance strain transducer comprising at least two support wafers defining a slot therebetween, a pair of driven capacitance plates carried on the surface of one of said support wafers interior of said slot, said driven capacitance plates comprising a plurality of elongate parallel spaced-apart projections, the projections of one of said driven capacitance plates being interposed between the projections of the other of said driven capacitance plates, a sensing capacitance plate carried on the surface of the other of said support wafers interior of said slot in parallel spaced relation to said driven capacitance plates and shutter means disposed between said driven capacitance plates and said sensing capacitance plate, said shutter means comprising a pair of apertured plates each having at least one aperture, the apertures of one of said apertured plates partially overlapping the apertures of the other of said apertured plates to define capacitance slots therethrough, the dimensions of said capacitance slot varying upon relative displacement of said apertured plates for varying the differential capacitance therebetween in response to displacement of said shutter means.

20. Apparatus according to claim 19 wherein the apertures of said apertured plates are generally rectangular, forming a plurality of elongate generally rectangular, capacitance slots respectively aligned with the projections of said driven capacitance plates.

21. Apparatus according to claim 19 wherein said sensing capacitance plate is generally rectangular corresponding to the area of said driven capacitance plates comprising said projections.

22. A capacitive strain transducer comprising:

a pair of differentially driven capacitance plates;

a sensing capacitance plate spaced parallel to said driven plates to define a channel therebetween;

first and second shutter plates disposed between said driven plates and said sensing plate in said channel, each shutter plate having therethrough at least one aperture partially overlapping an aperture in the other shutter plate to define a pair of capacitance slots through said first and second shutter plates, one of said pair of slots being aligned with the first of said driven plate pair and the other of said pair of slots being aligned with a second of said driven plate pair, the displacement of said shutter plates relative to one another varying the ratio of areas of said pair of slots upon relative displacement of said shutter plates for varying the differential capacitance between said driven capacitance plates relative to said sensing capacitance plate.

23. A capacitive strain transducer according to claim 22 further comprising oscillator means for applying A.C. carrier signals to said driven capacitance plates, the signals applied to one of said driven capacitance plates being 180°

out-of-phase with respect to the signals applied to the other of said driven capacitance plates, and means for detecting the magnitude and phase of the signals coupled to said sensing capacitance plate through said shutter plates.

24. A capacitive strain transducer according to claim 23, wherein said detecting means comprises a charge amplifier coupled to said sensing capacitance plate, and feedback means coupling the output and input of said charge amplifier to maintain the input of said charge amplifier at a virtual ground potential.

25. A capacitive strain transducer according to claim 24 wherein said feedback means comprises a capacitor.

26. A capacitive strain transducer according to claim 24, wherein said detecting means further comprises a phase-sensitive demodulator connected to the output of said charge amplifier.