Deposition of transparent amorphous carbon films
First Claim
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1. A method of depositing a transparent, resistive, amorphous carbon film on a glassy substrate which comprises:
- a. heating said glassy substrate to a temperature in the range of from about 300°
to 550°
C. but below the softening temperature of the substrate in an evacuated chamber,b. introducing a volatile hydrocarbon into said evacuated chamber,c. applying a D.C. glow discharge between two electrodes situated in said chamber, the cathode of which is said glassy substrate, at a current density of from about 0.05 to about 1.0 mA/cm2 for a period of about 15 seconds to about 3 minutes, so that said glassy substrate becomes coated with an amorphous carbon film.
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Abstract
Applying a D. C. glow discharge to a heated glassy substrate in an evacuated chamber to which a volatile hydrocarbon has been added, produces a glassy substrate coated with a hard, transparent, resistive, amorphous carbon coating.
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8 Claims
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1. A method of depositing a transparent, resistive, amorphous carbon film on a glassy substrate which comprises:
-
a. heating said glassy substrate to a temperature in the range of from about 300°
to 550°
C. but below the softening temperature of the substrate in an evacuated chamber,b. introducing a volatile hydrocarbon into said evacuated chamber, c. applying a D.C. glow discharge between two electrodes situated in said chamber, the cathode of which is said glassy substrate, at a current density of from about 0.05 to about 1.0 mA/cm2 for a period of about 15 seconds to about 3 minutes, so that said glassy substrate becomes coated with an amorphous carbon film. - View Dependent Claims (2, 3, 4, 5, 6)
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- 7. A transparent amorphous carbon film having a room temperature surface resistance of from about 1012 ohm/sq. to about 107 ohm/sq.
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