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Process for making hollow silicon bodies and bodies utilizing board-shaped members to form the basic geometric shape so made

  • US 4,062,714 A
  • Filed: 07/13/1976
  • Issued: 12/13/1977
  • Est. Priority Date: 09/16/1975
  • Status: Expired due to Term
First Claim
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1. A process for making hollow silicon bodies by decomposition from a gaseous compound containing silicon and depositing said silicon on heated carrier bodies, which comprises arranging in a decomposition reactor a plurality of board-shaped members of silicon in a geometrical pattern with the edges of adjacent members abutting one another to form a hollow carrier body, heating said body to the decomposition temperature of the gaseous compound by the passage of direct electric current therethrough, introducing the gas into the device whereby it is thermally decomposed, causing the silicon released thereby to become inseparately united with the hollow carrier body, the hollow silicon body so formed being immediately available for use in the semi-conductor industries.

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